Dual titanium nitride layers for solar control

• US 20010021540A1
• Filed: 12/27/2000
• Published: 09/13/2001
• Est. Priority Date: 11/02/1998
• Status: Active Grant

• Current Assignee: Solutia Singapore Pte. Ltd. (Eastman Chemical Company)
• Original Assignee: Globamatrix Holdings Pte., Ltd.
• Inventors: Woodard, Floyd Eugene, Dai, Yisheng
• Granted Patent: US 6,451,182 B2
• Time in Patent Office: Days
• US Class Current: 438/98
• CPC Class Codes: B32B 17/10018 comprising only one glass sheet
• CPC Class Codes: G02B 5/208 for use with infrared or ultraviolet radiation, e.g. for separating visible light from infrared and/or ultraviolet radiation

Abstract

A solar control member utilizes a combination of layers that include spaced apart titanium nitride layers to selectively transmit a higher percentage of visible light than near infrared energy, with a low visible light reflection. The titanium nitride layers are spaced apart by a distance that promotes optical decoupling with respect to occurrence of constructive and destructive interference of visible light propagating between the two titanium nitride layers. In one embodiment, the titanium nitride layers are spaced apart by a laminating adhesive layer. In another embodiment, the titanium nitride layers are formed on opposite sides of a substrate. The ratio of transmission at the wavelength of 550 nm to transmission at the wavelength of 1500 is at least 1.25. Each titanium nitride layer is sputter deposited. Care is taken to ensure that each layer does not become too metallic and to ensure that excessive oxygen is not incorporated into the layer. Thus, the nitrogen flow rate and the linespeed are controlled. Sputtering occurs at a fast rate using high powers and a minimum acceptable nitrogen flow, while minimizing background contamination.

Claims

1. A method of fabricating a solar control member comprising steps of:

sputtering a first titanium nitride layer on a first transparent substrate such that said first titanium nitride layer maintains a transmission of at least thirty percent with respect to visible light;

sputtering a second titanium nitride layer on a second transparent substrate such that said second titanium nitride layer maintains a transmissivity of at least thirty percent with respect to visible light; and

bonding said first titanium nitride layer to said second titanium nitride layer, including spacing said first titanium nitride layer from said second titanium nitride layer by a distance that is sufficient to promote optical decoupling therebetween.

2. The method of

claim 1

wherein said steps of sputtering include maintaining a sputtering environment in which a ratio of oxygen to nitrogen partial pressures is less than 0.5.

3. The solar control member of

claim 1

wherein said steps of sputtering include forming said first and second titanium nitride layers to contain less than 20 atomic percent of oxygen.

4. The solar control member of

claim 3

wherein said steps of sputtering include forming said first and second titanium nitride layers to contain less than 10 atomic percent of oxygen.

5. The method of

claim 1

wherein said steps of sputtering include using a mask on which a portion of titanium nitride plasma collects.

6. The method of

claim 1

wherein said bonding step includes applying a laminating adhesive between said first and second titanium layers, said laminating adhesive having a thickness of at least 700 nm, thereby promoting said optical decoupling with respect to constructive and destructive interference of visible light propagating therebetween.

7. The method of

claim 6

wherein said bonding step includes applying said laminating adhesive to a thickness of at least 3000 nm, said laminating adhesive being in contact with both of said first and second titanium nitride layers.

8. The method of

claim 1

further comprising a step of forming at least one layer of a transparent oxide or a transparent nitride between said first titanium layer and said first transparent substrate, said at least one layer having a refractive index that is at least as great as a refractive index of said first transparent substrate.

9. The method of

claim 8

wherein said step of forming said at least one layer includes forming a silicon nitride layer having a thickness in the range of 10 nm to 60 nm.

10. The method of

claim 1

further comprising forming a hardcoat layer and a lubricating layer on an exterior surface.

11. A method of fabricating a solar control member comprising steps of:

providing a substantially transparent substrate;

forming a first titanium nitride layer at a fixed position relative to a first surface of said transparent substrate; and

forming a second titanium nitride layer at a fixed position from said first titanium nitride layer, said first and second titanium nitride layers being on a same side of said transparent substrate and being spaced apart by a distance of at least 700 nm to provide optical decoupling with respect to constructive and destructive interference of visible light propagating between said first and second titanium nitride layers, wherein said first and second titanium nitride layers cooperate to provide a higher transmission of visible light than infrared light.

12. The method of

claim 11

further comprising a step of forming an optically massive layer which contacts each of said first and second titanium nitride layers, said optically massive layer having a thickness of at least 1000 nm, thereby providing said optical decoupling.

13. The method of

claim 12

wherein said step of forming said optically massive layer includes providing a laminating adhesive.

14. The method of

claim 11

wherein said steps of forming said first and second titanium nitride layers include using sputter deposition techniques.

15. The method of

claim 14

wherein said steps that include using sputter deposition techniques employ sputtering through a mask.

16. The method of

claim 11

further comprising steps of forming a hardcoat layer and a lubricating layer to provide protection to an exterior surface.

17. The method of

claim 11

further comprising a step of forming a layer of silicon nitride between said transparent substrate and said first titanium nitride layer, said silicon nitride having a thickness in the range of 10 nm to 60 nm.

18. The method of

claim 11

further comprising a step of forming a thin layer of transparent oxide or transparent nitride on a side of said second titanium nitride layer opposite to said first titanium nitride layer, said thin layer having a thickness in the range of 10 nm to 60 nm.