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Aligning method, exposure apparatus using this aligning method, and semiconductor device manufacturing method utilizing this exposure apparatus

  • US 20010041417A1
  • Filed: 03/13/2001
  • Published: 11/15/2001
  • Est. Priority Date: 03/15/2000
  • Status: Active Grant
First Claim
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1. An aligning method of a measuring position of an alignment mark within a plurality of sample shots formed on a substrate with a predetermined measurement condition, and positioning said substrate on the basis of a position measurement result, wherein said measurement condition is selected on the basis of a change amount of a position measurement value which is obtained from the position measurement result obtained by moving said alignment mark in a non-measurement direction different from a measurement direction and sequentially measuring a position of said alignment mark.

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