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Quality control plasma monitor for laser shock processing

  • US 20010045416A1
  • Filed: 06/29/2001
  • Published: 11/29/2001
  • Est. Priority Date: 02/19/1999
  • Status: Active Grant
First Claim
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1. An apparatus for monitoring laser shock processing of a workpiece, comprising:

  • a material applicator for applying an energy absorbing material onto the workpiece;

    a transparent overlay applicator for applying a transparent overlay onto the workpiece over said energy absorbing layer;

    a laser operatively associated with said energy absorbing layer; and

    at least one radiometer.

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