×

Plasma processing apparatus

  • US 20010050144A1
  • Filed: 02/02/2000
  • Published: 12/13/2001
  • Est. Priority Date: 07/05/1999
  • Status: Active Grant
First Claim
Patent Images

1. A plasma processing apparatus comprising a processing chamber, processing gas supply means for supplying one or more processing gases into the processing chamber, plasma generating means for changing the processing gases supplied into the processing chamber to a plasma, a mounting stage for mounting an object to be processed which is provided in the processing chamber, bias applying means for applying an electrical bias voltage to the mounting stage, a gas storage chamber which is placed at a position opposite to a face of the mounting stage on which the object being processed is mounted and which is provided with a supply system for supplying neutral particles or gases to generate the neutral particles, a partition plate which separates the gas storage chamber from the processing chamber and having jet holes for jetting the neutral particles into the processing chamber, and an exhaust system.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×