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Fluorescence radiation filter

  • US 20010050762A1
  • Filed: 12/01/2000
  • Published: 12/13/2001
  • Est. Priority Date: 12/01/1999
  • Status: Active Grant
First Claim
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1. A lithographic projection apparatus for imaging of a mask pattern in a mask onto a substrate provided with a radiation sensitive layer, the apparatus comprising:

  • a radiation system for supplying a projection beam of electromagnetic radiation with a wavelength less than 160 nm;

    a first object table for holding a mask;

    a second object table for holding a substrate;

    a projection system for imaging irradiated portions of the mask onto target portions of the substrate;

    characterised by further comprising;

    a filter, located in the projection beam path, for attenuating fluorescence radiation with a wavelength longer than that of the projection beam.

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