Height scanning interferometer for determining the absolute position and surface profile of an object with respect to a datum

• US 20010050773A1
• Filed: 01/25/2001
• Published: 12/13/2001
• Est. Priority Date: 05/19/2000
• Status: Active Grant

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: De Groot, Peter, De Lega, Xavier Colonna, Deck, Leslie L., Kramer, James W.
• Granted Patent: US 6,597,460 B2
• Time in Patent Office: Days
• US Class Current: 356/497
• CPC Class Codes: G01B 11/30 for measuring roughness or irregularity of surfaces
• CPC Class Codes: G01B 9/02058 by particular optical compensation or alignment elements, e.g. dispersion compensation
• CPC Class Codes: G01B 9/02078 Caused by ambiguity
• CPC Class Codes: G01B 9/02083 characterised by particular signal processing and presentation
• CPC Class Codes: G01B 9/0209 Low-coherence interferometers

Abstract

The invention features a surface profiling method including: collecting interferometric data related to a surface profile of a measurement object; and calculating the surface profile based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object. The invention also features a surface profiling system including: an interferometry system which during operation provides interferometric data related to a surface profile of a measurement object; and an electronic processor coupled the interferometry system, wherein during operation the electronic processor calculates the surface profile based on the interferometric data and at least one parameter indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object.

Claims

1. A surface profiling method for determining the relative positions of multiple points on an object surface including multiple surface materials, the method comprising:

collecting interferometric data related to the relative positions; and

calculating the relative positions based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) for each of the surface materials.

2. A surface profiling method for determining the relative positions of multiple points on an object surface including multiple surface materials, the method comprising:

collecting interferometric data related to the relative positions; and

calculating the relative positions based on the collected interferometric data and at least one value indicative of the phase change on reflection (PCOR) γ

_part for each of the surface materials.

3. A surface profiling method for determining the absolute position with respect to a common datum surface of each of multiple points on an object surface, the method comprising:

collecting interferometric data related to the absolute positions; and

calculating the absolute positions based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) of the object surface and dispersion in the phase change on reflection (PCOR) of an interferometry system used to collect the interferometric data.

4. A surface profiling method for determining the absolute position with respect to a common datum surface of each of multiple points on an object surface, the method comprising:

collecting interferometric data related to the absolute positions; and

calculating the absolute positions based on the collected interferometric data and at least one value indicative of the phase change on reflection (PCOR) of the object surface γ

_part and the phase change on reflection (PCOR) of an interferometry system used to collect the interferometric data γ

_sys.

5. A surface profiling method comprising:

collecting interferometric data related to a surface profile of a measurement object; and

calculating the surface profile based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object.

6. The method of

claim 5

, wherein the calculation of the surface profile is based on the collected interferometric data and multiple values indicative of dispersion in the phase change on reflection (PCOR) of different regions of the profiled surface of the measurement object.

7. The method of

claim 5

, wherein the calculation of the surface profile is based on the collected interferometric data and at least one value indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object and dispersion in the phase change on reflection (PCOR) of an interferometry system used to collect the interferometric data.

8. The method of

claim 5

, wherein the collection of interferometric data comprises collecting scanning interferometric data related to the surface profile of the measurement object.

9. The method of

claim 5

wherein the collected interferometric data comprises at least one phase value φ

(k) at a wavevector k for each of multiple points on the profiled surface, and wherein the calculation of the surface profile is based on the relationship

φ

(k)=2nk(h−

ζ

)+(γ

_part+γ

_sys)+(τ

_part+τ

_sys)(k−

k₀)

where h is the surface height, ζ

is a reference offset position, n is a refractive index, γ

_part is the phase change on reflection (PCOR) of the profiled surface at the wavevector k, γ

_sys is the phase change on reflection (PCOR) of an interferometry system used to collect the interferometric data at the wavevector k, τ

_part is the linear dispersion of the phase change on reflection (PCOR) of the profiled surface with respect to a reference wavevector k₀, and τ

_sys is the linear dispersion of the phase change on reflection (PCOR) of the interferometry system with respect to wavevector k₀.

10. The method of

claim 5

, wherein the collected interferometric data comprises multiple phase values φ

(k) corresponding to multiple wavevector values k for each of multiple points on the profiled surface, and wherein the calculation of the surface profile is based on the relationship

11. The method of

claim 5

, wherein the interferometric data is scanning interferometric data comprising multiple phase values φ

(ζ

) corresponding to multiple positions ζ

of a scanning reference mirror for each of multiple points on the profiled surface, and the calculation of the surface profile comprises transforming the multiple phase values for each point into a wavevector domain, calculating a derivative of the transformed phase values for each point with respect to wavevector, and calculating the surface profile from the derivative for each point and the at least one value indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object.

12. The method of

claim 11

, wherein the at least one value is indicative of the dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object and the dispersion in the phase change on reflection (PCOR) of a scanning interferometry system used to collect the interferometric data, and the calculated surface profile provides an absolute position with respect to a common datum surface for each of the multiple points on the profiled surface.

13. The method of

claim 5

, wherein the interferometric data comprises coherence profiling data and phase profiling data, and wherein the calculation of the surface profile comprises using the coherence profiling data and the at least one value indicative of the dispersion in the phase change on reflection (PCOR) to determine an initial estimate of the surface profile, and using the initial estimate to resolve fringe ambiguity in the phase profiling data.

14. The method of

claim 5

, wherein the at least one value is τ

_part+τ

_sys, where τ

_part is the linear dispersion of the phase change on reflection (PCOR) of the profiled surface with respect to a reference wavevector k₀, and τ

_sys is the linear dispersion of the phase change on reflection (PCOR) of an interferometry system used to collect the interferometric data with respect to the reference wavevector k₀.

15. The method of

claim 5

, wherein the at least one value comprises τ

_part and τ

_sys, where τ

_part is the linear dispersion of the phase change on reflection (PCOR) of the profiled surface with respect to a reference wavevector k₀, and τ

_sys is the linear dispersion of the phase change on reflection (PCOR) of an interferometry system used to collect the interferometric data with respect to the reference wavevector k₀.

16. The method of

claim 15

, wherein the at least one value further comprises γ

_part and γ

_sys, where γ

_part is the phase change on reflection (PCOR) of the profiled surface at a particular wavevector k, and γ

_sys is the phase change on reflection (PCOR) of the interferometry system at the wavevector k.

17. The method of

claim 5

, wherein the at least one value comprises a first value indicative of the dispersion in the phase change on reflection (PCOR) of the profiled surface and a second value indicative of a phase change on reflection (PCOR) of the profiled surface for a particular wavevector k.

18. The method of

claim 5

, wherein the calculated surface profile provides an absolute position with respect to a common datum surface of each of multiple points on the profiled surface.

19. The method of

claim 5

, wherein the collected interferometric data comprises coherence profiling intensity data as a function of a reference mirror scan position ζ

, wherein the calculation of the surface profile is based on the relationship

h=ζ

_max−

(τ

_sys−

τ

_part)/2n

where h is the surface height, ζ

_max is the reference scan position where the intensity data is maximized, n is a refractive index, τ

_part is the linear dispersion of the phase change on reflection (PCOR) of the profiled surface with respect to a reference wavevector k₀, and τ

_sys is the linear dispersion of the phase change on reflection (PCOR) of an interferometry system used to collect the interferometric data with respect to the reference wavevector k₀.

20. A surface profiling system comprising:

an interferometry system which during operation provides interferometric data related to a surface profile of a measurement object; and

an electronic processor coupled the interferometry system, wherein during operation the electronic processor calculates the surface profile based on the interferometric data and at least one parameter indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object.

21. The surface profiling system of

claim 20

, wherein the at least one parameter is indicative of dispersion in the phase change on reflection (PCOR) of the profiled surface of the measurement object and dispersion in the phase change on reflection (PCOR) of the interferometry system, and wherein the surface profile calculated by the electronic processor comprises an absolute position with respect to a common datum surface of each of multiple points on the profiled surface.

22. The surface profiling system of

claim 20

, wherein during operation the electronic processor calculates the surface profile based on the interferometric data and parameters indicative of dispersion in the phase change on reflection (PCOR) of different surface materials of the profiled surface.

23. The surface profiling system of

claim 20

, wherein the interferometry system comprises:

a broadband source;

a scanning interferometer which during operation directs a first wavefront derived from the source along a reference path and a second wavefront derived from the source along a measurement path contacting the measurement object, and, after the second wavefront contacts the measurement object, combines the wavefronts to produce an optical interference pattern;

a detector producing the interference data in response to the optical interference pattern; and

a scanning controller coupled to the interferometer and the detector, which during operation causes the scanning interferometer to vary the optical path difference between the reference and measurement paths.

24. A method for calibrating an interferometry system to determine at least one of the phase change on reflection (PCOR) of the interferometry system γ

_sys, and linear dispersion of the phase change of reflection (PCOR) of the interferometry system τ

_sys with respect to a reference wavevector k₀, the method comprising;

collecting interferometric data relating to a test surface using the interferometry system;

providing independent information for the profile h of the test surface, the phase change on reflection (PCOR) of the test surface γ

_part, and the linear dispersion of the phase change on reflection (PCOR) of the test surface τ

_part with respect to a reference wavevector k₀; and

calculating the at least one of the phase change on reflection (PCOR) of the interferometry system γ

_sys and the linear dispersion of the phase change of reflection (PCOR) of the interferometry system τ

_sys based on the interferometric data and the independent information.

25. The method of

claim 24

, wherein the collected interferometric data comprises at least one phase value φ

(k) at a wavevector k for each of multiple points on the test surface, and wherein the calculation of the surface profile is based on the relationship

φ

(k)=2nk(h−

ζ

)+(γ

_part+γ

_sys)−

(τ

_part−

τ

_sys)k−

k₀)

where ζ

is a reference offset position and n is a refractive index.

26. The method of

claim 24

, wherein the at least one of γ

_sys and τ

_sys comprises γ

_sys.

27. The method of

claim 24

, wherein the at least one of γ

_sys and τ

_sys comprises τ

_sys.

28. The method of

claim 24

, wherein the at least one of γ

_sys and τ

_sys comprises γ

_sys and τ

_sys, the interferometric data provides an experimentally observed phase gap G_ex, and the calculation of τ

_sys is based on the relationship

τ

_sys=[(γ

_part+γ

_sys−

G_ex)/k₀]−

τ

_part.

29. A method for measuring at least one of the phase change on reflection (PCOR) of test material γ

_part and linear dispersion of the phase change of reflection (PCOR) of the test material τ

_part with respect to a reference wavevector k₀, the method comprising;

collecting interferometric data relating to a test surface using an interferometry system;

providing independent information for the phase change on reflection (PCOR) of the interferometry system γ

_sys and the linear dispersion of the phase change on reflection (PCOR) of the interferometry system τ

_sys with respect to a reference wavevector k₀; and

calculating the at least one of the phase change on reflection (PCOR) of the test material γ

_part and the linear dispersion of the phase change of reflection (PCOR) of the test material τ

_part based on the interferometric data and the independent information.

30. The method of

claim 29

, wherein the at least one of γ

_part and τ

_part comprises τ

_part, the interferometric data provides an experimentally observed phase gap G_ex, and the calculation of τ

_part is based on the relationship τ

_part=[(γ

_part+τ

_sys−

G_ex)/k₀]−

τ

_sys.