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Exposure method and exposure apparatus

  • US 20010055733A1
  • Filed: 04/09/2001
  • Published: 12/27/2001
  • Est. Priority Date: 04/11/2000
  • Status: Abandoned Application
First Claim
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1. An exposure method which irradiates a slit-shaped energy beam on a mask and a sensitive object while moving them synchronously so as to sequentially transfer images of patterns formed on the mask to the sensitive object, including a step of moving a density filter having a attenuating part for gradually reducing an amount of energy of the energy beam in sychronization with the movement of the mask.

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