Exposure method and exposure apparatus
First Claim
1. An exposure method which irradiates a slit-shaped energy beam on a mask and a sensitive object while moving them synchronously so as to sequentially transfer images of patterns formed on the mask to the sensitive object, including a step of moving a density filter having a attenuating part for gradually reducing an amount of energy of the energy beam in sychronization with the movement of the mask.
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Accused Products
Abstract
An exposure method which irradiates a slit-shaped illumination light IL on a reticle Ri and a substrate while moving them synchronously so as to sequentially transfer images of patterns formed on the reticle Ri to the substrate 4, wherein a density filter Fj having an attenuating part for gradually reducing the distribution of illuminance of the illumination light IL is moved in synchronization with the movement of the reticle Ri.
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Citations
35 Claims
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1. An exposure method which irradiates a slit-shaped energy beam on a mask and a sensitive object while moving them synchronously so as to sequentially transfer images of patterns formed on the mask to the sensitive object, including
a step of moving a density filter having a attenuating part for gradually reducing an amount of energy of the energy beam in sychronization with the movement of the mask.
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9. An exposure method which relatively moves a mask and a sensitive object with respect to an energy beam and scans and exposes the sensitive object by the energy beam through the mask, including
a step of gradually reducing an amount of energy in a part of an area irradiated by the energy beam on the sensitive object in a first direction in which the sensitive object is moved, while relatively moving a slope part where the amount of energy is gradually reduced in the first direction in said irradiated area during the scan exposure.
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18. An exposure apparatus which irradiates a slit-shaped energy beam on a mask and a sensitive object while moving them synchronously so as to sequentially transfer images of patterns formed on the mask to the sensitive object, comprising
a density filter which adjusts the distribution of energy of the energy beam and a filter stage which moves the density filter in synchronization with the mask.
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19. An exposure apparatus comprising:
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a mask stage which moves a mask, a substrate stage which moves a substrate, an illumination optical system which irradiates a slit-shaped energy beam, a filter stage which moves a density filter having an attenuating part for gradually reducing an amount of energy of said energy beam and a controller which controls said mask stage, said substrate stage, and said filter stage so that said substrate and said density filter move synchronously with respect to said energy beam. - View Dependent Claims (20)
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21. An exposure apparatus which relatively moves a mask and a sensitive object with respect to an energy bean and scans and exposes the sensitive object by the energy beam through the mask, comprising:
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a density filter which gradually reduces an amount of energy in a part of an area irradiated by the energy beam on the sensitive object in a first direction in which the sensitive object is moved and an adjuster which shifts a slope part where the amount of energy is gradually reduced in the first direction in said irradiated area during the scan exposure. - View Dependent Claims (22, 23, 24)
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25. An exposure apparatus in which a mask and a sensitive object are moved relative to an energy beam and the sensitive object is scanned exposed by the energy beam through the mask, comprising:
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a first optical unit which defines the width of an area irradiated by the energy beam on the sensitive object in a first direction in which the sensitive object is moved during the scan exposure; and
a second optical unit which gradually reduces an amount of energy in a part of the irradiated area in the first direction, while shifting a slope part which the amount of energy is gradually reduced in the first direction within the irradiated area during the scan exposure. - View Dependent Claims (26, 27, 28, 29, 30, 31, 32, 33)
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Specification