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Method of fabricating liquid crystal display with a high aperture ratio

  • US 20020001048A1
  • Filed: 06/28/2001
  • Published: 01/03/2002
  • Est. Priority Date: 06/29/2000
  • Status: Abandoned Application
First Claim
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1. A method of fabricating a liquid crystal display with a high aperture ratio comprising the steps of:

  • forming a gate bus line including a gate electrode on a transparent insulating substrate and at the same time, forming a storage capacitor electrode in parallel with the gate bus line;

    depositing a gate insulating layer on the resulting entire surface;

    forming a semiconductor layer on the gate insulating layer over the gate electrode;

    forming a data line including source/drain electrodes on the semiconductor layer, thereby completing a thin film transistor;

    depositing an insulating layer on the resulting lower substrate, wherein the thickness of the insulating layer region formed over the storage capacitor electrode is thinner than that formed over the other part;

    forming a contact hole by selectively etching the insulating layer in order to expose a predetermined part of the drain electrode; and

    forming a pixel electrode on the insulating layer to be in contact with the exposed drain electrode.

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