×

Plasma processing apparatus having an evacuating arrangement to evacuate gas from a gas-introducing part of a process chamber

  • US 20020002948A1
  • Filed: 03/23/2001
  • Published: 01/10/2002
  • Est. Priority Date: 03/24/2000
  • Status: Abandoned Application
First Claim
Patent Images

1. A plasma processing apparatus for applying a plasma process to an object to be processed, the plasma processing apparatus comprising:

  • a process chamber in which the object to be processed is subjected to the plasma process;

    a gas-introducing part connected to said process chamber so as to introduce a reactant gas into said process chamber;

    a first vacuum pump connected to said process chamber so as to evacuate gas from said process chamber so that said process chamber is maintained at a negative pressure; and

    a gas-evacuating arrangement connected to said gas-introducing part so as to evacuate the reactant gas from said gas-introducing part.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×