POSITIONING STAGE SYSTEM AND POSITION MEASURING METHOD
First Claim
1. A stage system, comprising:
- a first stage movable at least in one of a rotational direction and a tilt direction;
a second stage movable at least in X and Y directions;
a measurement mirror system fixed to said second stage;
a reference mirror system disposed on said first stage; and
a measuring system for measuring displacement of said measurement mirror system in the X or Y direction, while using said reference mirror system as a positional reference;
wherein said reference mirror system is arranged so that laser light incident on said reference mirror system is reflected in the same direction as the incidence, substantially constantly.
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Accused Products
Abstract
A positioning stage system includes a first stage movable at least in one of a rotational direction and a tilt direction, a second stage movable at least in X and Y directions, a measurement mirror system fixed to the second stage, a reference mirror system disposed on the first stage, and a measuring system for measuring displacement of the measurement mirror system in the X or Y direction, while using the reference mirror system as a positional reference, wherein the reference mirror system is arranged so that laser light incident on the reference mirror system is reflected in the same direction as the incidence, substantially constantly.
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Citations
18 Claims
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1. A stage system, comprising:
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a first stage movable at least in one of a rotational direction and a tilt direction;
a second stage movable at least in X and Y directions;
a measurement mirror system fixed to said second stage;
a reference mirror system disposed on said first stage; and
a measuring system for measuring displacement of said measurement mirror system in the X or Y direction, while using said reference mirror system as a positional reference;
wherein said reference mirror system is arranged so that laser light incident on said reference mirror system is reflected in the same direction as the incidence, substantially constantly. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11)
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12. A position measuring method, comprising the steps of:
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mounting a reference mirror system on a first stage which is movable at least in one of a rotational direction and a tilt direction, wherein the reference mirror system is arranged so that laser light incident on the reference mirror system is reflected in the same direction as the incidence substantially constantly;
fixedly mounting a measurement mirror system on a second stage which is movable at least in X and Y directions;
measuring displacement of the measuring mirror system in X and Y directions while using the reference mirror system as a positional reference, on the basis of laser interference. - View Dependent Claims (13)
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14. An exposure apparatus, comprising:
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a mask stage for holding a mask and being movable at least in one of a rotational direction along the mask surface and a tilt direction to the mask surface;
a substrate stage for holding a substrate, to be exposed, and being movable in X and Y directions along an X-Y plane parallel to the substrate surface;
a measurement mirror system fixed to said substrate stage;
a reference mirror system disposed on said mask stage; and
a measuring system for measuring displacement of said measurement mirror system in the X or Y direction, while using said reference mirror system as a positional reference, and on the basis of laser interference;
wherein the substrate on said substrate stage can be aligned with respect to the mask on the basis of the measurement by said measuring system, and a pattern of the aligned mask can be transferred and printed onto the substrate; and
wherein said reference mirror system is arranged so that laser light incident on said reference mirror system is reflected in the same direction as the incidence, substantially constantly. - View Dependent Claims (15, 16, 17)
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18. A device manufacturing method, comprising the steps of:
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transferring, by exposure, a pattern of a mask onto a substrate by use of an exposure apparatus including (i) a mask stage for holding the mask and being movable at least in one of a rotational direction along the mask surface and a tilt direction to the mask surface, (ii) a substrate stage for holding the substrate, to be exposed, and being movable in X and Y directions along an X-Y plane parallel to the substrate surface, (iii) a measurement mirror system fixed to the substrate stage, (iv) a reference mirror system disposed on the mask stage, and (v) a measuring system for measuring displacement of the measurement mirror system in the X or Y direction, while using the reference mirror system as a positional reference, and on the basis of laser interference, wherein the substrate on the substrate stage can be aligned with respect to the mask on the basis of the measurement by the measuring system, and a pattern of the aligned mask can be transferred and printed onto the substrate, and wherein the reference mirror system is arranged so that laser light incident on the reference mirror system is reflected in the same direction as the incidence, substantially constantly; and
developing the exposed substrate, whereby a device can be produced from the substrate.
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Specification