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Manufacturing method of active matrix substrate

  • US 20020009890A1
  • Filed: 07/11/2001
  • Published: 01/24/2002
  • Est. Priority Date: 07/11/2000
  • Status: Active Grant
First Claim
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1. A manufacturing method of an active matrix substrate comprising the steps of:

  • a film lamination step for depositing a plurality of films to form laminated films on an insulating substrate;

    a resist pattern formation step for forming a resist pattern having a plurality of film thicknesses on said laminated films;

    a first etching step for etching said laminated films using said resist pattern as a first etching mask;

    a resist etching step for etching said resist pattern to remove a thinner portion of said resist pattern; and

    a second etching step for etching said laminated films using a remaining portion of said resist pattern left after said resist etching process as a second etching mask.

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