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Remote plasma mixer

  • US 20020011214A1
  • Filed: 12/22/2000
  • Published: 01/31/2002
  • Est. Priority Date: 04/12/1999
  • Status: Active Grant
First Claim
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1. A plasma generator in a semiconductor processing reactor, comprising a microwave choke including quarter-wavelength shorted coaxial conductors, the shorted coaxial conductors defining a choke enclosure, the enclosure filled with a solid material having a dielectric constant greater than about 3.

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