Visible light response type phptocatalyst

• US 20020012779A1
• Filed: 05/11/2001
• Published: 01/31/2002
• Est. Priority Date: 05/11/2000
• Status: Abandoned Application

• Current Assignee: Gunma Prefecture
• Original Assignee: Ichikoh Industries Limited (Valeo SE)
• Inventors: Enomoto, Minoru, Miyashita, Kiyoshi, Ubukata, Tsutomu, Kuroda, Shinichi
• Application Number:
  US09/852,767
• Publication Number:
  US 20020012779A1
• Time in Patent Office: Days
• US Class Current: 428/216
• CPC Class Codes: B01J 35/30 characterised by their physical properties
• CPC Class Codes: B01J 35/39 Photocatalytic properties
• CPC Class Codes: B01J 37/0244 Coatings comprising several layers
• CPC Class Codes: C03C 17/3417 all coatings being oxide coatings
• CPC Class Codes: C03C 2217/71 Photocatalytic coatings
• CPC Class Codes: Y10T 428/24975 No layer or component greater than 5 mils thick
• CPC Class Codes: Y10T 428/265 1 mil or less

Abstract

A present invention encompasses visible light response type photocatalyst having a titanium oxide layer, a mixture of titanium oxide and silicon oxide, and a silicon oxide layer, wherein these three layers are laminated in order onto a substrate.

Claims

1. A visible light response type photocatalyst comprising a titanium oxide, a mixture layer of titanium oxide and silicon oxide, and a silicon oxide layer, wherein the mixture layer and the silicon oxide layer are laminated, in order, onto the titanium oxide.

2. The visible light response type photocatalyst according to claim 1, wherein a thickness of said mixture layer is 2 to 50 nm, and a mixture rate of titanium oxide to silicon oxide is TiO₂:

SiO₂=5 to 95 to 95 to 5 in percentage by weight.

3. The visible light response type photocatalyst according to claim 1, wherein a thickness of said silicon oxide layer is 5 to 60 nm.

4. The visible light response type photocatalyst according to claim 2, wherein a thickness of said silicon oxide layer is 5 to 60 nm.

5. A hydrophilic film having self cleaning properties, comprising a substrate, a titanium oxide layer, a mixture layer of titanium oxide and silicon oxide, and a silicon oxide layer, wherein the titanium oxide layer, the mixture layer, and the silicon oxide layer are laminated, in order, onto the substrate.

6. The hydrophilic film having self cleaning properties according to claim 5, wherein a thickness of said mixture layer is 2 to 50 nm, a mixture rate of titanium oxide and silicon oxide is TiO₂:

SiO₂=5 to 95;

95 to 5 in percentage by weight.

7. The hydrophilic film having self-cleaning properties according to claim 5, wherein a thickness of said silicon oxide layer is 5 to 60 nm.

8. The hydrophilic film having self-cleaning properties according to claim 6, wherein the thickness of said silicon oxide layer is 5 to 60 nm.