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Method for applying an antireflection coating to inorganic optically transparent substrates

  • US 20020017452A1
  • Filed: 04/18/2001
  • Published: 02/14/2002
  • Est. Priority Date: 04/19/2000
  • Status: Abandoned Application
First Claim
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1. A method for applying an antireflection coating to a substrate of an optically transparent, inorganic material, wherein alternating layers of different refractive indices are applied to the substrate by means of a plasma-enhanced PVD process, more particularly by so-called sputtering, the distance between the target and the substrate being chosen such that the scratching resistance of the obtained layers is similar to or higher than that of the substrate.

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