STAGE APPARATUS, AND EXPOSURE APPARATUS AND DEVICE MANUFACTURING METHOD USING THE SAME

• US 20020021423A1
• Filed: 12/11/1998
• Published: 02/21/2002
• Est. Priority Date: 12/26/1997
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: KORENAGA, NOBUSHIGE, YABU, SHUICHI
• Granted Patent: US 6,414,742 B1
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03B 27/42 for automatic sequential copying of the same original G03B27/34, G03B27/53 take precedence
• CPC Class Codes: G03F 7/70691 Handling of masks or workpieces
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A stage apparatus includes a movable stage, a base supporting the stage on a reference plane, a driving mechanism for driving the stage, and a rotor acting on the stage and producing a moment so as to reduce a reaction force produced along with the movement of the stage. The rotor also reduces the reaction force produced upon movement of the stage by the movement of the base and the rotation of the rotor.

Claims

1. A stage apparatus comprising:

a movable stage;

a base, having a reference plane, supporting said stage;

a driving mechanism driving said stage; and

a rotor acting on said stage and producing a moment so as to reduce a reaction force produced along with movement of said stage.

2. A stage apparatus according to claim 1, wherein said rotor is provided on a member receiving the reaction force.

3. A stage apparatus according to claim 2, wherein the member receiving the reaction force is a base supporting said stage.

4. A stage apparatus according to claim 3, wherein said base moves to reduce the reaction force.

5. A stage apparatus according to claim 3, wherein said rotor produces a moment around an axis at right angles to the reference plane.

6. A stage apparatus according to claim 3, wherein said rotor produces a moment around an axis parallel to the reference plane.

7. A stage apparatus according to claim 4, further comprising a constraining mechanism which constrains motion of said base in the rotating direction within the reference plane.

8. A stage apparatus according to claim 3, wherein said stage is an XY-stage having a guide provided on said base.

9. A stage apparatus according to claim 3, wherein said driving mechanism is a guideless motor fixed to said stage.

10. A stage apparatus according to claim 9, wherein said guideless motor is a pulse motor.

11. A stage apparatus according to claim 9, wherein said guideless motor is an induction motor.

12. A stage apparatus according to claim 2, wherein th e member receiving the reaction force is a reaction force receiving mechanism arranged independently of said stage.

13. A stage apparatus according to claim 12, wherein the reaction force receiving mechanism includes a member integrally fixed to a floor.

16. A method according to claim 15, further comprising:

a step of coating a photosensitive material onto the wafer; and

a step of developing the photosensitized wafer.

14. An exposure apparatus comprising:

a stage apparatus comprising (i) a movable stage, (ii) a base having a reference plane supporting said stage, (iii) a driving mechanism driving said stage and (iv) a rotor acting on said stage and producing a moment to reduce a reaction force produced along with movement of said stage; and

a light source producing exposure light for exposing a wafer via a reticle.

15. A device manufacturing method comprising:

a step of providing an exposure apparatus including a stage apparatus comprising (i) a movable stage, (ii) a base having a reference plane supporting the stage, (iii) a driving mechanism driving the stage and (iv) a rotor acting on the stage and producing a moment to reduce a reaction force produced along with movement of the stage; and

a step of transferring a pattern formed on a reticle onto a wafers, by the use of the exposure apparatus.