Alignment system and alignment method in exposure apparatus

• US 20020024644A1
• Filed: 05/30/2001
• Published: 02/28/2002
• Est. Priority Date: 05/30/2000
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Miyata, Seiji, Ina, Hideki
• Granted Patent: US 6,493,065 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03B 27/42 for automatic sequential copying of the same original G03B27/34, G03B27/53 take precedence
• CPC Class Codes: G03F 7/70 Microphotolithographic exposure; Apparatus therefor photo-masks G03F1/00
• CPC Class Codes: G03F 9/70 for microlithography measuring printed patterns for monitoring overlay G03F7/70633 or focus G03F7/70641; projection system adjustment G03F7/70258; position control G03F7/70775

Abstract

Disclosed is an exposure system having an exposure apparatus for transferring a pattern of a first object onto a second object, which includes an exposure apparatus having a detecting system for performing relative alignment of the first object and the second object, a transmitting system for transmitting, to a remote location and through a public data line, a mark detection signal obtained by detection of a mark of the second object made by use of the detecting system and shape information obtained by measurement of a shape of the mark on the second object, and a calculating system for performing calculation of an offset of the exposure apparatus, at the remote location, wherein the calculating system transmits information, including the offset, to the exposure apparatus and through the public data line, and wherein, on the basis of the information including the offset, alignment of the first and second objects is executed by using the detecting system and an exposure process is performed in the exposure apparatus.

Claims

1. A system having an exposure apparatus for transferring a pattern of a first object onto a second object, said system comprising:

an exposure apparatus having a detecting system for performing relative alignment of the first object and the second object;

a transmitting system for transmitting, to a remote location and through a public data line, a mark detection signal obtained by detection of a mark of the second object made by use of said detecting system and shape information obtained by measurement of a shape of the mark on the second object; and

a calculating system for performing calculation of an offset of the exposure apparatus, at the remote location;

wherein said calculating system transmits information, including the offset, to the exposure apparatus and through the public data line; and

wherein, on the basis of the information including the offset, alignment of the first and second objects is executed by using said detecting system and an exposure process is performed in said exposure apparatus.

2. A system according to claim 1, wherein, for calculation of an offset on the basis of simulation, instructions for performing detection of plural marks under different conditions are supplied from the remote location through the public data line, and wherein the mark detection signal obtained by said detecting system at least under different conditions is fed to the remote location through the public data line.

3. A system according to claim 1, wherein, for measurement of the shape of the mark on the second object to be done outside the exposure apparatus, the surface shape is measured before and after application of a resist material.

4. A system according to claim 3, wherein the surface shape is measured by using a solid shape measuring device, at the time of calibration.

5. A system according to claim 4, wherein said solid shape measuring device comprises an atomic force microscope.

6. A system according to claim 1, wherein said solid shape measuring device comprises a probe type solid shape measuring device.

7. A system according to claim 1, wherein, when a surface shape of plural marks on the second object is measured outside the exposure apparatus and before and after resist application, an offset being harmonized with a signal of a detecting system for performing relative alignment of the first and second objects, in the exposure apparatus for transferring the pattern of the first object onto the second object, is used in the exposure apparatus.

8. A system according to claim 7, wherein the surface shape is measured outside the exposure apparatus, on the basis of optical three-dimensional measurement calibrated by a three-dimensional shape measuring system using non-exposure light.

9. A system according to claim 1, wherein said exposure apparatus has an alignment system being arranged so that, for alignment of plural second objects, in respect to first one of the second objects, an offset as being harmonized with a signal of a detecting system for performing relative alignment of the first and second objects is measured, and that, in respect to the remaining second objects, the same offset is used.

10. An adjusting method for use in an exposure apparatus for transferring a pattern of a first object onto a second object, said method comprising:

a first transmitting step for transmitting, to a remote location and through a public data line, a mark detection signal obtained by detecting a mark on the second object by use of a detecting system, for performing relative alignment of the first and second objects in the exposure apparatus, and shape information obtained by measuring a surface shape of the mark on the second object, outside the exposure apparatus and before and after resist application;

a calculating step for calculating an offset of the exposure apparatus, at the remote location; and

a second transmitting step for transmitting information, including the offset, to the exposure apparatus through the public data line;

wherein alignment of the first and second object is carried out by said detecting system and on the basis of the information including the offset, and an exposure process is carried out in the exposure apparatus.

11. A method according to claim 10, wherein the surface shape is measured using a solid shape measuring device, at the time of calibration.

12. A method according to claim 11, wherein the solid shape measuring device comprises an atomic force microscope.

13. A method according to claim 11, wherein the solid shape measuring device comprises a probe type solid shape measuring device.

14. A method according to claim 10, wherein, when a surface shape of plural marks on the second object is measured outside the exposure apparatus and before and after the resist application, an offset being harmonized with a signal of a detecting system for performing relative alignment of the first and second objects, in the exposure apparatus for transferring the pattern of the first object onto the second object, is used in the exposure apparatus.

15. A method according to claim 14, wherein the surface shape is measured outside the exposure apparatus, on the basis of optical three-dimensional measurement calibrated by a three-dimensional shape measuring system using non-exposure light.

16. A method of relatively aligning a first object and a second object with each other in an exposure apparatus for transferring a pattern of the first object onto the second object, comprising:

a first transmitting step for transmitting, to a remote location and through a public data line, a mark detection signal obtained by detecting a mark on the second object by use of a detecting system, for performing relative alignment of the first and second objects in the exposure apparatus, and shape information obtained by measuring a surface shape of the mark on the second object, outside the exposure apparatus and before and after resist application;

a calculating step for calculating an offset of the exposure apparatus, at the remote location; and

a second transmitting step for transmitting information, including the offset, to the exposure apparatus through the public data line;

wherein alignment of the first and second object is carried out by said detecting system and on the basis of the information including the offset, and an exposure process is carried out in the exposure apparatus; and

wherein, for alignment of plural second objects, in respect to first one of the second objects, an offset as being harmonized with a signal of a detecting system for performing relative alignment of the first and second objects is measured, and, in respect to the remaining second objects, the same offset is used.

17. A data processing system for calculating at least one of offset information and offset correction information in relation to an exposure apparatus for transferring a pattern of a first object onto a second object, said system comprising:

means for getting shape information related to a mark on the second object obtained at a remote location as well as detection information of the mark obtained by the exposure apparatus, through a public data line;

means for calculating the offset produced in the exposure apparatus, on the basis of the shape information and the detection information, got by said getting means; and

means for transmitting at least one of the offset information and the offset correction information to the exposure apparatus at the remote location, through the public data line.

18. An exposure system, comprising:

a plurality of exposure apparatuses each for transferring a pattern of a first object onto a second object; and

a data processing system for calculating at least one of offset information and offset correction information in relation to an offset to be produced in each exposure apparatus, said data processing system having (i) means for getting shape information related to a mark on the second object obtained at a remote location as well as detection information of the mark obtained by the exposure apparatus, through a public data line, (ii) means for calculating the offset produced in the exposure apparatus, on the basis of the shape information and the detection information, got by said getting means, and (iii) means for transmitting at least one of the offset information and the offset correction information to the exposure apparatus at the remote location, through the public data line;

wherein, on the basis of information supplied by said data processing system, offset correction is carried out for the exposure apparatuses being present at remote locations, and wherein an alignment process for alignment of the first and second objects is carried out in each exposure process, and an exposure process is carried out so that the pattern of the first object is transferred to the second object.

19. A device manufacturing method, comprising the steps of:

building an exposure system which includes a plurality of exposure apparatuses each for transferring a pattern of a first object onto a second object, and a data processing system for calculating at least one of offset information and offset correction information in relation to an offset to be produced in each exposure apparatus, the data processing system having (i) means for getting shape information related to a mark on the second object obtained at a remote location as well as detection information of the mark obtained by the exposure apparatus, through a public data line, (ii) means for calculating the offset produced in the exposure apparatus, on the basis of the shape information and the detection information, got by the getting means, and (iii) means for transmitting at least one of the offset information and the offset correction information to the exposure apparatus at the remote location, through the public data line;

performing, on the basis of information supplied by the data processing system, offset correction for the exposure apparatuses being present at remote locations;

performing an alignment process for alignment of the first and second objects, in each exposure process; and

performing an exposure process so that the pattern of the first object is transferred to the second object.

20. A device manufacturing method, comprising:

a first transmitting step for transmitting, to a remote location and through a public data line, a mark detection signal obtained by detecting a mark on a second object by use of a detecting system, for performing relative alignment of a first object and the second object in the exposure apparatus, and shape information obtained by measuring a surface shape of the mark on the second object, outside the exposure apparatus and before and after resist application;

a calculating step for calculating an offset of the exposure apparatus, at the remote location; and

a second transmitting step for transmitting information, including the offset, to the exposure apparatus through the public data line;

wherein alignment of the first and second object is carried out by the detecting system and on the basis of the information including the offset, and an exposure process is carried out in the exposure apparatus, for production of a device from the second object.

21. A system having an exposure apparatus for transferring a pattern of a first object onto a second object, said system comprising:

an exposure apparatus having a detecting system for performing relative alignment of the first object and the second object;

a transmitting system for transmitting, to a remote location and through a public data line, a mark detection signal obtained by detection of a mark of the second object made by use of said detecting system and shape information obtained by measurement of a shape of the mark on the second object; and

a calculating system for preparing a database of information including apparatus error information, at the remote location, and also for performing calculation of an offset on the basis of simulation;

wherein said calculating system transmits information, including the offset, to the exposure apparatus and through the public data line; and

wherein, on the basis of the information including the offset, alignment of the first and second objects is executed by using said detecting system and an exposure process is performed in said exposure apparatus.

22. A system having an exposure apparatus for transferring a pattern of a first object onto a second object, said system comprising:

a production factory being equipped with (i) a group of production machines for various processes, including an exposure apparatus having a detecting system for performing relative alignment of the first and second objects, (ii) a local area network for connecting the production machines with each other, and (iii) a gateway for enabling access from the local area network to a public data line outside the production factory, such that data communication for information related to at least one of the production machines is enabled, and that a mark detection signal obtained by detecting a mark on the second object by use of the detecting system as well as shape information obtained by measuring the shape of the mark on the second object can be transmitted to a remote location, from the local area network and through the public data line; and

a calculating system for calculating an offset of the exposure apparatus, at the remote location;

wherein said calculating system transmits information, including the offset, to the exposure apparatus through the public data line and the local area network; and

wherein, on the basis of the information including the offset, alignment of the first and second objects is executed by using said detecting system and an exposure process is performed in said exposure apparatus.

23. A system according to claim 22, wherein a user interface for enabling access to a maintenance database provided by a user or a vendor of the exposure apparatus and being connected to the public data line, is presented on a display, such that information can be obtained from the database through an external network.

27. A method according to claim 26, further comprising a counting step for counting the frequency of data receptions through the receiving step, wherein the bill calculation is performed while taking into account the frequency of data receptions.

29. A method according to claim 28, further comprising a storing step for memorizing the frequency of data receptions through the receiving step, wherein the bill calculation is performed while taking into account the frequency of data receptions.

30. A method according to claim 28, wherein the reception of information at said receiving step is carried out with respect to plural remote locations.

24. An adjusting method for a plurality of exposure apparatuses each for transferring a pattern of a first object onto a second object, said method comprising:

a first transmitting step for transmitting, in relation to each of the exposure apparatuses, shape information related to a mark on a second object to be used in that exposure apparatus and detection information obtained by detecting the mark on the second object in that exposure apparatus, limitedly to a vendor only who supplied that exposure apparatus, through a public data line; and

a second transmitting step for transmitting, from each vendor, at least one of offset information and offset correction information back to a corresponding exposure apparatus, through the public data line.

25. A device manufacturing method for use with a plurality of exposure apparatuses each for transferring a pattern of a first object onto a second object, said method comprising:

a first transmitting step for transmitting, in relation to each of the exposure apparatuses, shape information related to a mark on a second object to be used in that exposure apparatus and detection information obtained by detecting the mark on the second object in that exposure apparatus, limitedly to a vendor only who supplied that exposure apparatus, through a public data line; and

a second transmitting step for transmitting, from each vendor, at least one of offset information and offset correction information back to a corresponding exposure apparatus, through the public data line; and

a transfer step for performing pattern transfer to a second object by use of an exposure apparatus having been adjusted on the basis of the offset information and/or the offset correction information, such that a device can be produced from the second object.

26. A method of supplying adjustment information for an exposure apparatus for transferring a pattern of a first object onto a second object, said method comprising:

a receiving step for receiving, from a remote location and through a public data line, a mark detection signal obtained by detecting a mark on the second object by use of a detecting system for performing relative alignment of the first and second objects in the exposure apparatus, as well as shape information obtained by measuring the mark of the second object, outside the exposure apparatus and before and after resist application;

a calculating step for preparing a database on the basis of data received at the remote location and also for calculating an offset of the exposure apparatus by use of the database;

an offset transmitting step for transmitting information, including the offset, to the exposure apparatus and through the public data line, wherein, on the basis of the information including the offset, relative alignment of the first and second objects is carried out, and an exposure process is carried out in the exposure apparatus; and

a bill calculating step for calculating a charge to be applied to a user of the exposure apparatus in regard to the offset transmission.

28. A method of supplying adjustment information for an exposure apparatus for transferring a pattern of a first object onto a second object, said method comprising:

a receiving step for receiving, from a remote location and through a public data line, a mark detection signal obtained by detecting a mark on the second object by use of a detecting system for performing relative alignment of the first and second objects in the exposure apparatus, as well as information related to a surface shape of the mark on the second object;

a calculating step for preparing a database on the basis of data received at the remote location and also for calculating an offset of the exposure apparatus by use of the database;

an offset transmitting step for transmitting information, including the offset, to the exposure apparatus and through the public data line, wherein, on the basis of the information including the offset, relative alignment of the first and second objects is carried out, and an exposure process is carried out in the exposure apparatus; and

a bill calculating step for calculating a charge to be applied to a user of the exposure apparatus in regard to the offset transmission.

31. A computer system for supplying adjustment information to an exposure apparatus for transferring a pattern of a first object onto a second object, said computer system comprising:

connection means for enabling communication with a public data line; and

a software introduced to carry out a procedure including (i) a receiving step for receiving, from a remote location and through the public data line, a mark detection signal obtained by detecting a mark on the second object by use of a detecting system for performing relative alignment of the first and second objects in the exposure apparatus, as well as information related to a surface shape of the mark on the second object, (ii) a calculating step for preparing a database on the basis of data received at the remote location and also for calculating an offset of the exposure apparatus by use of the database, (iii) an offset transmitting step for transmitting information, including the offset, to the exposure apparatus and through the public data line, wherein, on the basis of the information including the offset, relative alignment of the first and second objects is carried out, and wherein an exposure process is carried out in the exposure apparatus, and (iv) a bill calculating step for calculating a charge to be applied to a user of the exposure apparatus in regard to the offset transmission.