Light absorbing pattern film coated article production method and light absorbing pattern film coated articles

• US 20020025425A1
• Filed: 06/22/2001
• Published: 02/28/2002
• Est. Priority Date: 10/25/1999
• Status: Active Grant

• Current Assignee: Nippon Sheet Glass Company Limited (Nippon Telegraph and Telephone Corporation)
• Original Assignee: Nippon Sheet Glass Company Limited (Nippon Telegraph and Telephone Corporation)
• Inventors: Kawazu, Mitsuhiro
• Granted Patent: US 6,790,583 B2
• Time in Patent Office: Days
• US Class Current: 428/323
• CPC Class Codes: C03C 17/007 containing a dispersed phase, e.g. particles, fibres or flakes, in a continuous phase
• CPC Class Codes: C03C 17/008 comprising a mixture of materials covered by two or more of the groups C03C17/02, C03C17/06, C03C17/22 and C03C17/28
• CPC Class Codes: C03C 2217/45 Inorganic continuous phases
• CPC Class Codes: C03C 2217/477 Titanium oxide
• CPC Class Codes: C03C 2217/479 Metals
• CPC Class Codes: C09D 1/00 Coating compositions, e.g. paints, varnishes or lacquers, based on inorganic substances
• CPC Class Codes: C09D 5/32 Radiation-absorbing paints protection against X-, gamma- or corpuscular radiation G21F
• CPC Class Codes: C09D 5/38 Paints containing free metal not provided for above in groups C09D5/00 - C09D5/36
• CPC Class Codes: G02B 5/22 Absorbing filters G02B5/201 - G02B5/208 take precedence
• CPC Class Codes: Y10T 428/24802 Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
• CPC Class Codes: Y10T 428/25 Web or sheet containing structurally defined element or component and including a second component containing structurally defined particles

Abstract

A method of producing a light absorbing pattern film coated article with a transmitted light spectrum distribution corresponding to the pattern of a photomask, wherein a light absorbing film coating solution, containing a silicon oxide raw material, a titanium oxide raw material, which contains titanium oxide microparticles, and a gold microparticle raw material, is coated onto the surface of a substrate, the photomask is positioned on top of said coated film, ultraviolet light is irradiated onto said coated film, and said coated film is thereafter heated.

By the abovementioned method of producing, this invention can provide light absorbing film coated articles with various transmitted light spectra distribution while keeping the visible light reflectivity low.

Claims

1. A method of producing a light absorbing pattern film coated article with a transmitted light spectrum distribution corresponding to the pattern of a photomask, wherein a light absorbing film coating solution, containing a silicon oxide raw material, a titanium oxide raw material, which contains titanium oxide microparticles, and a gold microparticle raw material, is coated onto the surface of a substrate, the photomask is positioned on top of said coated film, ultraviolet light is irradiated onto said coated film, and said coated film is thereafter heated.

2. A method of producing a light absorbing pattern film coated article as set forth in claim 1, wherein said light absorbing film coating solution contains the following as main components at the following weight % of solid components;

said silicon oxide raw material 45to 93% (as SiO₂),

said titanium oxide raw material 3to 30% (as TiO₂),

with at least 50 weight % (as TiO₂) of said titanium oxide raw material being titanium oxide microparticles, and

said gold microparticle raw material 4 to 30% (as Au).

3. A method of producing a light absorbing pattern film coated article as set forth in claim 2, wherein said light absorbing film coating solution contains, in addition to said silicon oxide raw material, said titanium oxide raw material, and said gold microparticle raw material, the raw material of at least one oxide selected from a group comprised of cobalt oxide, zirconium oxide, aluminum oxide, iron oxide, bismuth oxide, zinc oxide, tin oxide, indium oxide, antimony oxide, vanadium oxide, chromium oxide, copper oxide, manganese oxide, nickel oxide, cerium oxide, boron oxide, tantalum oxide, tungsten oxide, ytterbium oxide at a total content as Co₃O₄, ZrO₂, Al₂O₃, Fe₂O₃, Bi₂O₃, ZnO, SnO₂, In₂O₃, Sb₂O₃, V₂O₅, Cr₂O₃, CuO, MnO, NiO, Ce₂O₃, B₂O₃, Ta₂O₅, WO₃, and Yb₂O₃, respectively, of 15 weight % or less.

4. A method of producing a light absorbing pattern film coated article as set forth in any of claims 1 through 3, wherein said photomask has a pattern comprised of microscopic ultraviolet ray transmitting regions and microscopic ultraviolet ray blocking regions.

5. A method of producing a light absorbing pattern film coated article as set forth in any of claims 1 through 4, wherein said titanium oxide microparticles have an average particle diameter of 100 nm or less.

6. A method of producing a light absorbing pattern film coated article as set forth in any of claims 1 through 5, wherein said substrate is comprised of glass, ceramic, or resin.

7. A light absorbing pattern film coated article arranged by coating a silicon oxide-titanium oxide light absorbing film containing gold micro particles characterized in that, said light absorbing film has a plurality of at least first light absorbing microscopic regions, containing gold microparticles that are mainly reduced by ultraviolet rays and having a pink transmission color tone, and second light absorbing microscopic regions, containing gold microparticles that are mainly reduced by heat and having a blue transmission color tone, in a neighboring manner.