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Optical proximity correction

  • US 20020026626A1
  • Filed: 08/23/2001
  • Published: 02/28/2002
  • Est. Priority Date: 08/24/2000
  • Status: Active Grant
First Claim
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1. A method of optical proximity correction, comprising the actions of:

  • modeling the transfer of a design pattern to a reticle, to thereby produce a reticle pattern image;

    modeling the transfer of said reticle pattern image to a wafer, to thereby produce a wafer pattern image;

    generating a comparison of said wafer pattern image and a reference pattern; and

    modifying said design pattern if said step of generating a comparison fails to satisfy a set of design rules.

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