Aerial image measurement method and unit, optical properties measurement method and unit, adjustment method of projection optical system, exposure method and apparatus, making method of exposure apparatus, and device manufacturing method
First Claim
8. An optical properties measurement method to measure optical properties of a projection optical system, said measurement method including:
- illuminating a predetermined mark with an illumination light and forming an aerial image of said mark on an image plane via said projection optical system;
scanning a pattern forming member, which has at least one slit-shaped aperture pattern with a predetermined slit width extending in a first direction within a two dimensional plane perpendicular to an optical axis of said projection optical system, within a surface close to said image plane parallel to said two dimensional plane in a second direction which is perpendicular to said first direction, and photo-electrically converting said illumination light having passed through said aperture pattern and obtaining a photoelectric conversion signal which corresponds to an intensity of said illumination light having passed through said aperture pattern; and
obtaining optical properties of said projection optical system based on said photoelectric conversion signal.
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Accused Products
Abstract
The exposure apparatus comprises a mark plate on which a plurality of types of measurement marks each used for self-measurement are formed, a reticle stage on which the mark plate is mounted, and an aerial image measurement unit. On a slit plate of the aerial image measurement unit, a slit is formed extending in the non-scanning direction which width in the measurement direction is equal to and under (wavelength λ/numerical aperture N.A of the projection optical system). Therefore, in a state where a predetermined pattern is illuminated with the illumination light to form an aerial image of the pattern via the projection optical system, and when the slit plate is scanned in the measurement direction with respect to the aerial image, the light having passed through the slit during the scanning is photo-electrically converted with the photoelectric conversion element. And, based on the photoelectric conversion signal, the control unit measures the light intensity corresponding to the aerial image with a sufficiently high accuracy in practical usage. In addition, various self-measurements become possible, by moving the reticle stage so as to position the plurality of types of measurement marks respectively in the vicinity of a focal position on the object side of the projection optical system.
611 Citations
43 Claims
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8. An optical properties measurement method to measure optical properties of a projection optical system, said measurement method including:
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illuminating a predetermined mark with an illumination light and forming an aerial image of said mark on an image plane via said projection optical system;
scanning a pattern forming member, which has at least one slit-shaped aperture pattern with a predetermined slit width extending in a first direction within a two dimensional plane perpendicular to an optical axis of said projection optical system, within a surface close to said image plane parallel to said two dimensional plane in a second direction which is perpendicular to said first direction, and photo-electrically converting said illumination light having passed through said aperture pattern and obtaining a photoelectric conversion signal which corresponds to an intensity of said illumination light having passed through said aperture pattern; and
obtaining optical properties of said projection optical system based on said photoelectric conversion signal. - View Dependent Claims (1, 2, 3, 4, 5, 6, 7, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 28, 29, 30, 39, 40, 41, 42)
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24-1. The optical properties measurement method according to claim 23, wherein said first mark and said second mark are the same.
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26. An aerial image measurement unit that measures an aerial image of a predetermined mark formed by a projection optical system, said measurement unit comprising:
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an illumination unit which illuminates said mark to form an aerial image of said mark onto an image plane via said projection optical system;
a pattern forming member, which has at least one slit-shaped aperture pattern extending in a first direction within a two dimensional plane perpendicular to an optical axis of said projection optical system which width in a second direction being perpendicular to said first direction is greater than zero, and equal to and under said wavelength λ
of said illumination light divided by said numerical aperture N.A. of said projection optical system (λ
/N.A.);
a photoelectric conversion element which photo-electrically converts said illumination light having passed through said aperture pattern, and outputs a photoelectric conversion signal corresponding to an intensity of said illumination light; and
a processing unit which scans said pattern forming member in said second direction within a surface parallel to said two dimensional plane in the vicinity of said image plane in a state where said mark is illuminated by said illumination unit and said aerial image is formed on said image plane, and measures a light intensity distribution corresponding to said aerial image based on said photoelectric conversion signal output from said photoelectric conversion element. - View Dependent Claims (27)
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31. An exposure apparatus that illuminates a predetermined pattern with an illumination light to transfer said pattern onto a substrate via a projection optical system, said exposure apparatus comprising:
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a self-measurement master on which a plurality of types of measurement marks used for self-measurement are formed; and
a self-measurement master mounting stage on which said self measurement master is mounted, and which can move said self-measurement master close to a focal position on an object side of said projection optical system where said illumination light can illuminate. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 43)
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Specification