Active matrix organic el display device and method of forming the same
First Claim
Patent Images
1. A pixel structure of an electroluminescence display device, said structure including;
- a luminescent region which exhibits a luminescence upon application of an electric field;
a circuitry region including at least a circuitry; and
an optical shielding structure provided between said luminescent region and said circuitry region for shielding said circuitry region from said luminescence from said luminescent region.
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Abstract
The present invention provides an active matrix organic electroluminescence display device including: a transparent substrate; a plurality of pixels aligned over the transparent substrate, wherein each of the pixels further includes: a luminescent region which exhibits a luminescence upon application of an electric field; a circuitry region including at least a circuitry; and an optical shielding structure provided between the luminescent region and the circuitry region for shielding the circuitry region from the luminescence from the luminescent region.
108 Citations
37 Claims
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1. A pixel structure of an electroluminescence display device, said structure including;
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a luminescent region which exhibits a luminescence upon application of an electric field;
a circuitry region including at least a circuitry; and
an optical shielding structure provided between said luminescent region and said circuitry region for shielding said circuitry region from said luminescence from said luminescent region. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 28, 29, 30, 31, 32, 37)
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14. An active matrix organic electroluminescence display device including:
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a transparent substrate;
a plurality of pixels aligned over said transparent substrate, each of said pixels further including;
a luminescent region which exhibits a luminescence upon application of an electric field;
a circuitry region including at least a circuitry; and
an optical shielding structure provided between said luminescent region and said circuitry region for shielding said circuitry region from said luminescence from said luminescent region.
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27. A method of forming an optical shielding structure between a luminescent region and a circuitry region in a pixel of an electroluminescence display device for shielding said circuitry region from a luminescence from said luminescent region, said method comprising the steps of:
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selectively forming an optical shielding layer over a substrate on said circuitry region;
forming a first insulating layer over said optical shielding layer and said substrate;
forming a circuitry over said first insulating layer on said circuitry region;
forming a second insulating layer over said circuitry and said first insulating layer;
forming at least a first contact hole, which penetrates said second insulating layer and reaches a part of said circuitry, and at least a second contact hole, which penetrates said first and second insulating layers and reaches a part of said optical shielding layer;
selectively forming at least a wiring layer electrically connected through said at least first contact hole to said circuitry and also at least an optical shielding wall within said at least second contact hole, wherein said optical shielding wall is in contact with said optical shielding layer.
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33. A method of forming an optical shielding structure between a luminescent region and a circuitry region in a pixel of an electroluminescence display device for shielding said circuitry region from a luminescence from said luminescent region, said method comprising the steps of:
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selectively forming an optical shielding layer over a substrate on said circuitry region;
forming a first insulating layer over said optical shielding layer and said substrate;
forming a circuitry over said first insulating layer on said circuitry region;
forming a second insulating layer over said circuitry and said first insulating layer;
forming at least a first contact hole, which penetrates said first and second insulating layers and reaches a part of said optical shielding layer;
selectively forming at least an optical shielding wall within said at least first contact hole, wherein said optical shielding wall is in contact with said optical shielding layer;
forming a third insulating layer over said at least optical shielding wall and said second insulating layer;
forming at least a second contact hole, which penetrates said second and third insulating layer and reaches a part of said circuitry; and
selectively forming at least a wiring layer electrically connected through said at least second contact hole to said circuitry. - View Dependent Claims (34, 35, 36)
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Specification