×

Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus

  • US 20020053634A1
  • Filed: 12/12/2001
  • Published: 05/09/2002
  • Est. Priority Date: 08/11/1997
  • Status: Active Grant
First Claim
Patent Images

1. An electron beam apparatus, comprising:

  • a table which mounts a specimen and is movable in three dimensional directions;

    an electron optical system including an electron beam source, an element for deflecting electron beams emitted from the electron beam source, an objective lens for converging and irradiating electron beams deflected by the deflection element onto a specimen mounted on the table and a detector for detecting a secondary electron emanated from the specimen by the irradiation of the electron beams;

    a surface height detection unit which optically detects a height of a surface of the specimen by projecting light onto the surface of the specimen from an oblique direction to the surface and detecting light reflected from the specimen; and

    a focus controller which focuses the electron beam onto the surface of the specimen by controlling a position of the table in a height direction in accordance with information of the height from the surface height detection unit.

View all claims
  • 0 Assignments
Timeline View
Assignment View
    ×
    ×