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Method and measuring instrument for determining the position of an edge of a pattern element on a substrate

  • US 20020057839A1
  • Filed: 09/24/2001
  • Published: 05/16/2002
  • Est. Priority Date: 09/23/2000
  • Status: Active Grant
First Claim
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1. A method for determining the position of an edge to be measured of a pattern element on a substrate, in which a one-dimensional measured intensity profile is ascertained from a camera image of the edge and the position p of the edge relative to a reference point is determined therefrom, comprising the steps:

  • a) ascertaining and storing a complete, nonlinear model intensity profile, which identifies the edge to be measured, of a model edge;

    b) defining with subpixel accuracy a desired model edge position xk in the model intensity profile;

    c) acquiring a camera image, made up of pixel rows and pixel columns, of the edge to be measured;

    d) placing a rectangular measurement window onto the camera image transversely over the edge;

    e) determining from the image signals of the pixels of the measurement window a one-dimensional measured intensity profile of the edge;

    f) identifying the model intensity profile in the measured intensity profile with an indication of its location xm relative to a reference point; and

    g) determining with subpixel accuracy the position p, referred to said reference point, of the edge to be measured, as p=xm+k.

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