Sterilization system employing a switching module adapted to pulsate the low frequency power applied to a plasma
First Claim
1. A sterilization system that applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article, the low frequency power having a frequency less than or equal to approximately 200 kHz, the sterilization system comprising:
- a switching module adapted to pulsate the low frequency power applied to the plasma;
a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma, the low frequency power feedback control system comprising;
a power monitor adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber;
a power control module adapted to produce a second signal in response to the first signal from the power monitor; and
a power controller adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.
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Accused Products
Abstract
A sterilization system and method applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article. The sterilization system includes a switching module adapted to pulsate the low frequency power applied to the plasma and a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma. A power monitor is adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber. A power control module is adapted to produce a second signal in response to the first signal from the power monitor, and a power controller is adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed.
55 Citations
30 Claims
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1. A sterilization system that applies low frequency power to a plasma within a vacuum chamber to remove gas or vapor species from an article, the low frequency power having a frequency less than or equal to approximately 200 kHz, the sterilization system comprising:
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a switching module adapted to pulsate the low frequency power applied to the plasma;
a low frequency power feedback control system for controllably adjusting the low frequency power applied to the plasma, the low frequency power feedback control system comprising;
a power monitor adapted to produce a first signal indicative of the low frequency power applied to the plasma within the vacuum chamber;
a power control module adapted to produce a second signal in response to the first signal from the power monitor; and
a power controller adapted to adjust, in response to the second signal, the low frequency power applied to the plasma to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A method of controllably adjusting a low frequency power applied to a plasma within a vacuum chamber of a sterilization system to remove gas or vapor species from an article, the low frequency power having a frequency less than or equal to approximately 200 kHz, the method comprising:
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pulsating the low frequency power applied to the plasma;
monitoring the low frequency power applied to the plasma within the vacuum chamber;
generating a first signal indicative of the low frequency power applied to the plasma; and
adjusting the low frequency power applied to the plasma in response to the first signal to maintain a substantially stable average low frequency power applied to the plasma while the article is being processed. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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Specification