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Plasma processing apparatus and plasma processing method

  • US 20020069971A1
  • Filed: 01/23/2002
  • Published: 06/13/2002
  • Est. Priority Date: 03/01/1996
  • Status: Abandoned Application
First Claim
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1. A plasma processing apparatus comprising a vacuum processing chamber, a plasma generating means including a pair of electrodes, a sample table having a sample mounting surface for mounting a sample to be processed inside said vacuum processing chamber, and a evacuating means for evacuating said vacuum processing chamber, which further comprises:

  • a high frequency electric power source for applying a high frequency electric power of a VHF band from 30 MHz to 300 MHz between said pair of electrodes; and

    a magnetic field forming means for forming any one of a static magnetic field and a low frequency magnetic field in a direction intersecting an electric field generated between said pair of electrodes and the vicinity by said high frequency electric power source;

    wherein an electron cyclotron resonance region being formed between said pair of electrodes by said magnetic field and said electric field.

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