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Particle beam biaxial orientation of a substrate for epitaxial crystal growth

  • US 20020073918A1
  • Filed: 12/15/2000
  • Published: 06/20/2002
  • Est. Priority Date: 12/15/2000
  • Status: Active Grant
First Claim
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1. A method of increasing the extent of a desired biaxial orientation of a previously formed non-single-crystal structure comprising the steps of:

  • (a) contacting said structure with an oblique particle beam thereby forming in said structure a nucleating surface having increased desired biaxial orientation; and

    (b) depositing a layer onto said previously formed structure, which layer is capable of attaining a biaxial orientation in registry with said nucleating surface.

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