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Seed layer recovery

  • US 20020074242A1
  • Filed: 10/13/2001
  • Published: 06/20/2002
  • Est. Priority Date: 10/13/2000
  • Status: Abandoned Application
First Claim
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1. A method of removing oxidized metal from a metal seed layer comprising the steps of:

  • a) contacting a metal seed layer containing oxidized metal disposed on a substrate with an aqueous solution having a pH maintained in the range of about 6.5 to about 13;

    b) subjecting the solution to a voltage of from about 0.1 to 5 volts to reduce the oxidized metal; and

    c) monitoring the reduction of the oxidized metal to provide a seed layer substantially free of all oxidized metal species.

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