Thin film device provided with coating film, liquid crystal panel and electronic device, and method for making the thin film device
First Claim
1. A thin film device having a thin film monolithic structure comprising a plurality of thin films including at least one insulating layer and at least one conductive layer, wherein at least one of said thin films in said thin film monolithic structure is formed of a coating film (excluding a spin-on-glass film having a basic structure comprising siloxane bonds), which is obtained by applying a solution containing a constituent of said thin film followed by annealing.
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Abstract
Any one of an insulating film forming a TFT, a silicon film and a conductive film is formed by applying a solution and annealing it. In a spin coater (102), a coating solution containing a thin film component which is supplied from a solution storage section (105) is spin-coated onto a substrate. The substrate after coating the coating solution is annealed in an annealing section (103) to form a coating film on the substrate. Additional laser annealing improves one of film characteristics, i.e., crystallinity, density and adhesiveness. Application of the coating solution or a resist by an ink jet process increases utilization of the solution and permits forming a patterned coating film. Because a thin film device in accordance with the present invention is inexpensive and has a high throughput, TFT production by a production system having high utilization of the coating solution drastically reduces initial investment and production cost of a liquid crystal display device.
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Citations
59 Claims
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1. A thin film device having a thin film monolithic structure comprising a plurality of thin films including at least one insulating layer and at least one conductive layer, wherein
at least one of said thin films in said thin film monolithic structure is formed of a coating film (excluding a spin-on-glass film having a basic structure comprising siloxane bonds), which is obtained by applying a solution containing a constituent of said thin film followed by annealing.
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35. A method for making a thin film device having a thin film monolithic structure comprising a plurality of thin films including at least one insulating layer and at least one conductive layer;
the manufacturing steps of at least one of said thin films in said thin film monolithic structure comprising;
a step for applying a coating solution containing a constituent of said thin film onto a substrate; and
a step for forming a coating film (excluding a spin-on-glass film having a basic structure comprising siloxane bonds) by annealing the coated surface on said substrate. - View Dependent Claims (52)
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53. A method for making a thin film device comprising:
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preparing a coating solution-dispenser head having a plurality of nozzles, and discharging said coating solution onto only the coating region on a substrate while changing a relative position between said substrate and said plurality of nozzles to form a patterned coating film on said substrate. - View Dependent Claims (54, 55, 56, 57, 58, 59)
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Specification