Composition for forming polishing pad, crosslinked body for polishing pad, polishing pad using the same and method for producing thereof

• US 20020078632A1
• Filed: 10/23/2001
• Published: 06/27/2002
• Est. Priority Date: 10/24/2000
• Status: Active Grant

• Current Assignee: JSR Corporation
• Original Assignee: JSR Corporation
• Inventors: Kobayashi, Yutaka, Hasegawa, Kou, Koumura, Tomoo
• Granted Patent: US 6,645,264 B2
• Time in Patent Office: Days
• US Class Current: 51/298
• CPC Class Codes: B24B 37/24 characterised by the composition or properties of the pad materials
• CPC Class Codes: B24D 3/32 for porous or cellular structure

Abstract

It is an object of the invention to provide a composition for forming a polishing pad comprising substances having specific functional groups exhibiting excellent hydrophilic properties and the like, a crosslinked body for polishing pad as well as a polishing pad with excellent water resisting and durability which exhibits excellent polishing performance including a high removal rate and method for producing thereof. The composition for forming a polishing pad comprises a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups. And a water-soluble substance such as cyclodextrin may be contained. A polishing pad can be manufactured using the composition above or the crosslinked body for polishing pad, and porous polishing pads may also be obtained.

Claims

1. A composition for forming a polishing pad comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups and [B] a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups.

2. The composition for forming a polishing pad according to claim 1, wherein the amount of [A] is 40 to 99.9 wt % and the amount of [B] is 0.1 to 60 wt %, based on 100 wt % of the total of [A] and [B].

3. The composition for forming a polishing pad according to claim 1, further comprising [C] a water-soluble substance.

4. The composition for forming a polishing pad according to claim 3, wherein the amount of [C] is 5 to 50 vol % based on 100 vol % of the total of [A], [B] and [C].

5. The composition for forming a polishing pad according to claim 4, wherein said crosslinkable elastomer is 1,2-polybutadiene.

6. The composition for forming a polishing pad according to claim 4, wherein [C] is cyclodextrin.

7. A crosslinked body for a polishing pad produced by using the composition for forming a polishing pad which is comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups and [B] a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups.

8. The crosslinked body for a polishing pad according to claim 7, further containing [C] a water-soluble substance in said composition for forming a polishing pad.

9. A polishing pad produced by using the composition for forming a polishing pad which is comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups and [B] a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups.

10. The polishing pad according to claim 9, wherein the amount of [A] is 40 to 99.9 wt % and the amount of [B] is 0.1 to 60 wt %, based on 100 wt % of the total of [A] and [B].

11. The polishing pad according to claim 10, wherein said crosslinkable elastomer is 1,2-polybutadiene.

12. The polishing pad according to claim 9, further containing [C] a water-soluble substance in said composition for forming a polishing pad.

13. The polishing pad according to claim 12, wherein the amount of [C] is 5 to 50 vol % based on 100 vol % of the total of [A], [B] and [C].

14. The polishing pad according to claim 13, wherein said crosslinkable elastomer is 1,2-polybutadiene.

15. The composition for forming a polishing pad according to claim 13, wherein [C] is cyclodextrin.

17. The method for producing a polishing pad according to claim 16, wherein the amount of [A] is 40 to 99.9 wt % and the amount of [B] is 0.1 to 60 wt %, based on 100 wt % of the total of [A] and [B].

18. The method for producing a polishing pad according to claim 17, further mixing said formulation (I) and [C] a water-soluble substance whose amount is 5 to 50 vol % based on 100 vol % of the total of [A], [B] and [C].

16. A method for producing a polishing pad comprising:

a first step for kneading a formulation (I) comprising [A] a crosslinkable elastomer having no carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups and [B] a water-insoluble substance having at least one functional group selected from the group consisting of carboxyl, amino, hydroxyl, epoxy, sulfonic acid and phosphoric acid groups, and

a second step for molding into a polishing pad.