Reaction mass for a stage device
First Claim
1. A support system for stabilizing and supporting a base on a stationary surface, the base supporting a device which is moved by a predetermined force, the support system comprising:
- at least one bearing to support the base which allows the base to move relative to the stationary surface, the base moving due to at least one of a reaction force and a disturbance force acting on the base, the reaction force being responsive to the predetermined force acting on the device supported by the base; and
at least one actuator to control movement of the base in at least one degree of freedom.
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Accused Products
Abstract
A stage assembly and support system are provided to stabilize a stage base, such as a wafer stage base or a reticle stage base, minimizing forces transmitted from the stage assembly to a stationary surface, such as the ground, and thereby preventing vibration of other parts or systems in a wafer manufacturing process. Depending of the applicable photolithography system, a reticle stage and/or a wafer stage are accelerated in response to a wafer manufacturing control system to position the semiconductor substrates. The jerking motions of the reticle stage and/or wafer stage cause reaction forces acting on the reticle stage base and/or wafer stage base. The reaction forces induce vibration to the stationary surface and surrounding parts of the photolithography system. The wafer stage assembly and support system according to this invention allow the reticle stage base and/or wafer stage base to move relative the stationary surface. The base, acting as a massive reaction mass, stores a kinetic energy from the reaction force and gradually dissipates such energy by applying small forces to the reaction mass. The stage assembly and support system according to this invention are also capable of canceling any disturbance forces acting on the base.
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Citations
79 Claims
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1. A support system for stabilizing and supporting a base on a stationary surface, the base supporting a device which is moved by a predetermined force, the support system comprising:
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at least one bearing to support the base which allows the base to move relative to the stationary surface, the base moving due to at least one of a reaction force and a disturbance force acting on the base, the reaction force being responsive to the predetermined force acting on the device supported by the base; and
at least one actuator to control movement of the base in at least one degree of freedom. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31, 32, 33, 34, 35, 37, 38, 39, 40, 41, 42, 43, 44, 45, 46, 47, 48, 49, 50, 51, 52, 57, 68, 76, 77, 78, 79)
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17. A stage assembly for manufacturing semiconductor wafers, comprising:
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a stage to position at least one substrate, the stage being moved by a first member of a force generator in response to a wafer manufacturing control system;
a base supporting the stage, the base being allowed to move in response to a reaction force generated by a second member of the force generator;
at least one bearing to support the base allowing the base to move relative to a stationary surface; and
at least one actuator to control movement of the base, the movement being caused by at least one of a disturbance force and a reaction force.
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36. A stage assembly for manufacturing semiconductor wafers, comprising:
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a stage to position at least one substrate, the stage being moved in accordance with a wafer manufacturing control system;
a base supporting the stage, the base being allowed to move in response to a reaction force generated by a movement of the stage;
at least one bearing to allow the base to levitate above a stationary surface; and
at least one actuator to control movement of the base, the movement being caused by at least one of a disturbance force and a reaction force.
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53. A method for reducing a vibration force transmitted by a base to a stationary surface, comprising the steps of:
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supporting the base and levitating the base above the stationary surface so that the base can move relative to the stationary surface; and
controlling movement of the base in at least one degree of freedom, the movement being caused by at least one of a disturbance force and a reaction force. - View Dependent Claims (54, 55, 56, 58, 59, 60, 61, 62, 63, 64, 65, 66, 67, 69, 70, 71, 72, 73, 74, 75)
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Specification