Point array maskless lithography
First Claim
Patent Images
1. A system for performing digital lithography onto a subject, the system comprising:
- a light source for producing a first light;
an optical element for individually focusing the first light into a plurality of second lights;
a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights; and
a lens system for directing the digital pattern to the subject.
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Abstract
A system for performing digital lithography onto a subject is provided. The system includes a noncoherent light source for producing a first light and an optical diffraction element for individually focusing the first light into a plurality of second lights. The system also includes a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights. A lens system may then direct the digital pattern to the subject, thereby enabling the lithography.
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Citations
5 Claims
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1. A system for performing digital lithography onto a subject, the system comprising:
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a light source for producing a first light;
an optical element for individually focusing the first light into a plurality of second lights;
a pixel panel for generating a digital pattern, the pixel panel having a plurality of pixels corresponding to the plurality of second lights; and
a lens system for directing the digital pattern to the subject. - View Dependent Claims (2, 3, 4, 5)
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Specification