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Versatile atomic layer deposition apparatus

  • US 20020100418A1
  • Filed: 03/11/2002
  • Published: 08/01/2002
  • Est. Priority Date: 05/12/2000
  • Status: Abandoned Application
First Claim
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1. An atomic layer deposition apparatus comprising:

  • a first atomic layer deposition region for depositing a first gas species on a first substrate as a monolayer;

    a second atomic layer deposition region for depositing a second gas species on said first substrate as a monolayer, said first and second deposition regions being chemically isolated from one another; and

    a loading assembly for moving said first substrate from said first deposition region to said second deposition region, thereby enabling deposition of a first atomic monolayer in said first deposition region, followed by deposition of a second atomic monolayer in said second deposition region.

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