Raster shaped beam, electron beam exposure strategy using a two dimensional multipixel flash field
First Claim
1. A charged particle beam column for writing variable shaped beams onto a surface, comprising:
- a source of a charged particle beam;
a transfer lens positioned downstream of said source;
a first aperture element coaxial with said beam and positioned downstream of said source and that defines an opening;
a first deflector coaxial with said beam and positioned downstream of said first aperture element, and which generates an electric field;
a second aperture element coaxial with said beam and positioned downstream of said first deflector and defining at least one opening, wherein said electric field directs said beam onto said at least one opening thereby to variably shape said beam, said at least one opening comprising at least one opening having a side not parallel to another side;
a second deflector coaxial with said beam and positioned downstream of said second aperture element, and which generates a second electric field;
magnetic coil deflectors positioned downstream of said second deflector thereby to raster scan said beam; and
an objective lens, wherein said objective lens focuses said variably shaped beam onto said surface and controls a final size of said variably shaped beam on said surface.
1 Assignment
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Accused Products
Abstract
An apparatus includes: a rasterizer which rasterizes a surface of the substrate into pixels and outputs gray level values, where the gray level values specify a proportion of a pixel that overlaps with the pattern; a buffer coupled to receive and store the gray level values from the rasterizer; a flash converter coupled to receive the gray level values from the buffer, where the flash converter outputs shape data that define a flash field; a dose value circuitry coupled to the rasterizer, where the dose value circuitry computes dose values associated with the shape data; a converter coupled to receive the shape data from the flash converter and associated dose values from the dose value circuitry, where the converter outputs signals that specify a shape of the flash field, duration of the flash field, and a position of the flash field on the substrate; and a charged particle beam column coupled to receive the signals from the converter, and which generates the flash field as specified by the signals from the converter.
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Citations
34 Claims
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1. A charged particle beam column for writing variable shaped beams onto a surface, comprising:
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a source of a charged particle beam;
a transfer lens positioned downstream of said source;
a first aperture element coaxial with said beam and positioned downstream of said source and that defines an opening;
a first deflector coaxial with said beam and positioned downstream of said first aperture element, and which generates an electric field;
a second aperture element coaxial with said beam and positioned downstream of said first deflector and defining at least one opening, wherein said electric field directs said beam onto said at least one opening thereby to variably shape said beam, said at least one opening comprising at least one opening having a side not parallel to another side;
a second deflector coaxial with said beam and positioned downstream of said second aperture element, and which generates a second electric field;
magnetic coil deflectors positioned downstream of said second deflector thereby to raster scan said beam; and
an objective lens, wherein said objective lens focuses said variably shaped beam onto said surface and controls a final size of said variably shaped beam on said surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 18, 19, 20, 21, 22, 23, 24, 25, 27, 28, 29, 30, 31, 32, 33, 34)
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17. A method for shaping a charged particle beam, comprising:
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generating said charged particle beam;
shaping said beam through a first opening;
deflecting said shaped beam through a second opening spaced apart from said first opening, said second opening comprising at least one opening having a side not parallel to another side, thereby further shaping said beam; and
deflecting said further shaped beam in a raster scan.
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26. A method for shaping a charged particle beam, comprising:
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generating said charged particle beam;
shaping said beam through a first opening;
deflecting said shaped beam through at least one second opening spaced apart from said first opening, said at least one second opening comprising at least one of one or more substantially L-shaped openings or cross-shaped openings or openings having one edge not parallel to an opposite edge, thereby further shaping said beam; and
deflecting said further shaped beam in a raster scan.
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Specification