Co-base target and method of producing the same
First Claim
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1. A Co-base target produced by powder sintering, which comprises from more than 10 atomic % to 25 atomic % of B (boron) and not more than 100 ppm of oxygen as an impurity.
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Abstract
The invention relates to a Co-base target made of a sintered powder, having a restrained amount of oxygen, and a producing method thereof. The target contains from more than 10 to not more than 25 at % of B and not more than 100 ppm of oxygen. It may contain 30≧Pt≧5 at%, 30≧Cr≧10 at%, 10≧Ta>0 at% and/or 30≧Ni>0 at%. It may contain also from more than 0 (zero) to not more than 15 at% in total of one or more elements selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and rare earth elements. The target is produced by melting a Co-base alloy together with an additive B in an amount of from more than 10 to not more than 25 at% whereby deoxidizing, rapidly cooling the molten metal to produce an alloy powder and sintering the alloy powder. It can be optionally produced by mixing the above alloy powder with another metal powder, more particularly consisting of one or more elements selected from the group consisting of Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and Pt, and sintering the powder mixture.
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Citations
28 Claims
- 1. A Co-base target produced by powder sintering, which comprises from more than 10 atomic % to 25 atomic % of B (boron) and not more than 100 ppm of oxygen as an impurity.
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9. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
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10. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
- 11. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 30 atomic % Ni, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
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12. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, from more than zero to 30 atomic % Ni, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
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13. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
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14. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
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15. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 30 atomic % Ni, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
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16. A Co-base target produced by powder sintering, which consists essentially of from more than 10 atomic % to 25 atomic % of B (boron), 5 to 30 atomic % Pt, 10 to 30 atomic % Cr, from more than zero to 10 atomic % Ta, from more than zero to 30 atomic % Ni, from more than zero to 15 atomic % in a total amount of at least one element selected from the group consisting of Ti, Zr, Hf, V, Nb, Mo, W, Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and REM, not more than 100 ppm of oxygen as an impurity and the balance mainly of Co.
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17. A method of producing a Co-base target, which comprises:
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melting a Co-base alloy and an additive B (boron), whereby deoxidizing the Co-base alloy, subjecting the resultant Co-base alloy to a rapid cooling treatment to obtain a powder of the Co-base alloy, and sintering the thus obtained alloy powder.
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18. A method of producing a Co-base target, which comprises:
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melting a Co-base alloy and an additive B (boron), whereby deoxidizing the Co-base alloy, subjecting the resultant Co-base alloy to a rapid cooling treatment to obtain a powder of the Co-base alloy, mixing the Co-base alloy powder and another metal powder, and sintering the thus obtained mixed powder.
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19. A method of producing a Co-base target, which comprises:
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melting a Co-base alloy and an additive B (boron), whereby deoxidizing the Co-base alloy, subjecting the resultant Co-base alloy to a rapid cooling treatment to obtain a powder of the Co-base alloy, mixing the Co-base alloy powder and a metal powder of at least one element selected from the group consisting of Cu, Ag, Au, Ru, Rh, Pd, Os, Ir and Pt, and sintering the thus obtained mixed powder.
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Specification
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Current AssigneeHitachi Metals (Thailand) Ltd.
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Original AssigneeHitachi Metals (Thailand) Ltd.
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InventorsUeno, Tomonori, Murata, Hideo, Taniguchi, Shigeru, Ueno, Hide
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Application NumberUS09/995,567Publication NumberTime in Patent OfficeDaysField of SearchUS Class Current419/12CPC Class CodesC22C 19/07 based on cobaltC23C 14/3414 Metallurgical or chemical a...
