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X-ray image sensor and method for fabricating the same

  • US 20020117668A1
  • Filed: 02/08/2002
  • Published: 08/29/2002
  • Est. Priority Date: 11/30/1999
  • Status: Active Grant
First Claim
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1. An X-ray image sensor, comprising:

  • a substrate;

    a gate electrode on the substrate;

    a first insulation film on the substrate that covers the gate electrode;

    an amorphous silicon film formed on the first insulation film over the gate electrode;

    a doped amorphous silicon film defining a channel region for the amorphous silicon film on the amorphous silicon film;

    source and drain electrodes on the doped amorphous silicon film that are spaced apart from each other;

    a ground line on the first insulation film and that is spaced apart from the source and gate electrodes;

    a second insulation film covering the ground line, the source and drain electrodes, amorphous silicon film, the channel region, and the first insulation film, the second insulation film including a first contact hole that exposes a portion of the ground line and a second contact hole that exposes a portion of the source electrode;

    a first capacitor electrode on the second insulation film, the first capacitor electrode having an electrical connection with the ground line through the first contact hole;

    an electron transport electrode on the second insulation film, the electron transport electrode having an electrical connection with the source electrode through the second contact X hole;

    a dielectric layer covering the second insulation film, the first capacitor electrode, and the electron transport electrode, the dielectric layer having a third contact hole that exposes a portion of the electron transport electrode; and

    a second capacitor electrode on the dielectric layer, the second capacitor electrode having an electrical connection with the electron transport electrode through the third contact hole.

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