Light waveguide forming method, electrolyte solution, light waveguide forming apparatus and light waveguide
First Claim
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1. A light waveguide forming method comprising the steps of:
- disposing a light waveguide forming substrate having a conductive thin film and a photosemiconductor thin film in this order on an insulative substrate so that at least the photosemiconductor thin film of the light waveguide forming substrate is in contact with an aqueous electrolyte solution containing film forming material having a property that solubility or dispersibility in a water solution decreases according to change of its pH; and
applying a voltage between a selected region of the photosemiconductor thin film and a counter electrode by irradiating the selected region of the photosemiconductor thin film with light to deposit the material on the selected region of the semiconductor thin film.
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Abstract
In a method for forming a light waveguide, a light waveguide forming substrate is disposed so that a photosemiconductor thin film or a conductive thin film on the substrate is in contact with an aqueous electrolyte solution containing a film forming material having a property that solubility or dispersibility to a water solution decreases according to the pH change, and a voltage is applied between the photosemiconductor thin film or the conductive thin film and a counter electrode by light irradiation.
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Citations
19 Claims
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1. A light waveguide forming method comprising the steps of:
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disposing a light waveguide forming substrate having a conductive thin film and a photosemiconductor thin film in this order on an insulative substrate so that at least the photosemiconductor thin film of the light waveguide forming substrate is in contact with an aqueous electrolyte solution containing film forming material having a property that solubility or dispersibility in a water solution decreases according to change of its pH; and
applying a voltage between a selected region of the photosemiconductor thin film and a counter electrode by irradiating the selected region of the photosemiconductor thin film with light to deposit the material on the selected region of the semiconductor thin film. - View Dependent Claims (3, 4, 5, 6, 7, 10, 11, 12, 13, 14, 15, 17)
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2. A light waveguide forming method comprising the steps of:
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disposing a film deposition substrate having a conductive thin film, an photosemiconductor thin film, and a peel layer in this order on an insulative substrate so that at least the photosemiconductor thin film of the film deposition substrate is in contact with an aqueous electrolyte solution containing film forming material having a property that the solubility or dispersibility in a water solution decreases according to change of its pH;
applying a voltage between a selected region of the photosemiconductor thin film and a counter electrode by irradiating the selected region of the photosemiconductor thin film with light to deposit the material on the selected region of the semiconductor thin film; and
transferring the deposited material onto a light waveguide forming substrate.
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8. A light waveguide forming method comprising the steps of:
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disposing a light waveguide forming substrate having a conductive thin film or a patterned conductive thin film on an insulative substrate so that the conductive thin film or the patterned conductive thin film of the light waveguide forming substrate is in contact with an aqueous electrolyte solution containing film forming material having a property that solubility or dispersibility in a water solution decreases according to change of its pH; and
applying a voltage between the conductive thin film or the patterned conductive thin film and a counter electrode to deposit the film forming material on the conductive thin film.
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9. A light waveguide forming method comprising the steps of:
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disposing a film deposition substrate having a conductive thin film or a patterned conductive thin film, and a peel layer in this order on an insulative substrate so that at least the conductive thin film or the patterned conductive thin film of the film deposition substrate is in contact with an aqueous electrolyte solution containing film forming material having a property that solubility or dispersibility in a water solution decreases according to change of its pH;
applying a voltage between the conductive thin film or the patterned conductive thin film and a counter electrode to deposit the film forming material on the conductive thin film; and
transferring the deposited film forming material onto a light waveguide forming substrate.
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16. An electrolyte solution used in a light waveguide forming method containing a film forming material having a property that solubility or dispersibility in a water solution decreases according to change of its pH, wherein the film forming material has hydrophobic groups and hydrophilic groups, and the percentage of the number of hydrophobic groups to the total number of hydrophilic groups and hydrophobic groups is in a range from 30% to 80%.
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18. A light waveguide forming apparatus for forming a light waveguide, comprising:
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a light source that applies light;
an image forming optical system that has a first image forming lens and a second image forming lens;
a photomask inserted between the first image forming optical lens and the second image forming optical lens;
a counter electrode, a unit that is capable of applying a bias voltage; and
an electrodeposition tank filled with an electrolyte solution.
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19. A light waveguide having a core and a clad, at least one of the core and clad including an electrodeposited polymer material.
Specification