Plasma processing apparatus
First Claim
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1. A plasma processing apparatus comprising:
- a process chamber for processing by means of plasma;
microwave transmission means for transmitting microwave to said process chamber;
a dielectric for radiating the microwave transmitted by said microwave transmission means into said process chamber; and
a slot antenna plate formed of conductor, placed on a side, facing said process chamber, of said dielectric, and including an opening for passing the microwave therethrough radiated from said dielectric.
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Abstract
A slot antenna plate is placed on a second dielectric for radiating microwave into a chamber interior, the slot antenna plate being provided on a side of the second dielectric that faces the chamber interior. The slot antenna plate is made of conductor and includes slots for passing the microwave therethrough to the chamber interior. In this way, a plasma processing apparatus is provided generating plasma by microwave, the plasma processing apparatus capable of easily adjusting ion irradiation energy for a material to be processed to achieve uniform plasma processing for the material within the plane of the material.
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Citations
4 Claims
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1. A plasma processing apparatus comprising:
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a process chamber for processing by means of plasma;
microwave transmission means for transmitting microwave to said process chamber;
a dielectric for radiating the microwave transmitted by said microwave transmission means into said process chamber; and
a slot antenna plate formed of conductor, placed on a side, facing said process chamber, of said dielectric, and including an opening for passing the microwave therethrough radiated from said dielectric. - View Dependent Claims (2, 3, 4)
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Specification