Micro-electro-mechanical switch and a method of using and making thereof
First Claim
Patent Images
1. A switch comprising:
- at least one portion of a conductive line;
a beam with imbedded charge, the beam having a conductive section which is positioned in substantial alignment with the at least one portion of the conductive line, the conductive section of the beam having an open position spaced away from the at least one portion of the conductive line and a closed position on the at least one portion of the conductive line;
an control electrodes, each of the control electrodes spaced away from an opposing side of the beam to control movement of the beam.
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Abstract
A micro-electro-mechanical switch includes at least one portion of a conductive line in the chamber, a beam with imbedded charge, and control electrodes. The beam has a conductive section which is positioned in substantial alignment with the at least one portion of the conductive line. The conductive section of the beam has an open position spaced away from the at least one portion of the conductive line and a closed position on the at least one portion of the conductive line. Each of the control electrodes is spaced away from an opposing side of the beam to control movement of the beam.
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Citations
35 Claims
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1. A switch comprising:
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at least one portion of a conductive line;
a beam with imbedded charge, the beam having a conductive section which is positioned in substantial alignment with the at least one portion of the conductive line, the conductive section of the beam having an open position spaced away from the at least one portion of the conductive line and a closed position on the at least one portion of the conductive line;
ancontrol electrodes, each of the control electrodes spaced away from an opposing side of the beam to control movement of the beam. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 24, 25, 26, 27, 28, 29, 30, 31)
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12. A method of using a switch, the switch having a beam with imbedded charge and control electrodes, the beam having a conductive section located at or adjacent an edge of the beam and which is positioned in substantial alignment with at least one portion of a conductive line, each of the control electrodes spaced away from an opposing side of the beam to control movement of the beam, the method comprising:
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applying a potential with a first polarity to the control electrodes; and
moving the conductive section on to one of an open position spaced away from the at least one portion of the conductive line or a closed position on the at least one portion of the conductive line in response to the first polarity of the applied potential.
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23. A method for making a switch, the method comprising:
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forming at least one portion of a conductive line;
forming a beam with imbedded charge, the beam at least having a conductive section which is positioned in substantial alignment with the at least one portion of the conductive line, the conductive section of the beam having an open position spaced away from the at least one portion of the conductive line and a closed position on the at least one portion of the conductive line; and
forming control electrodes, each of the control electrodes spaced away from an opposing side of the beam to control movement of the beam.
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32. A method for making a switch, the method comprising:
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filling at least three trenches in a base material with a first conductive material, wherein the first conductive material in two of the trenches forms a separated portions of a conductive line and the first conductive material in the other trench forms a first control electrode;
depositing a first insulating layer on at least a portion of the first conductive material and the base material;
forming a trench in a portion of the first insulating layer which extends to at least a portion of the first conductive material;
filling the trench in the portion of the first insulating layer with a first sacrificial material;
forming a beam from at least one the charge holding material over at least a portion of the first insulating layer and the first sacrificial material, the beam having a conductive section which is at least partially in alignment with at least a part of the first conductive material in the trenches in the base material that form the separated portions of the conductive line;
depositing a second insulating layer over at least a portion of the beam, the first sacrificial material, and the first insulating layer;
forming a trench in the second insulating layer which extends to at least a portion of the beam and the first sacrificial material;
filling the trench in the second insulating layer with a second sacrificial material;
charging the beam;
depositing a second conductive material over at least a portion of the second insulating layer and the second sacrificial material;
forming a second control electrode from the second conductive material over at least a portion of the second insulating layer and the second sacrificial material;
depositing a third insulating layer over at least a portion of the second control electrode, the second sacrificial material, and the second insulating layer;
forming at least one access hole to the first and second sacrificial materials; and
removing the first and second sacrificial materials to form a chamber and sealing the access hole. - View Dependent Claims (33, 34, 35)
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Specification