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Plasma processing method and apparatus with control of plasma excitation power

  • US 20020139477A1
  • Filed: 03/30/2001
  • Published: 10/03/2002
  • Est. Priority Date: 03/30/2001
  • Status: Abandoned Application
First Claim
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1. A method of processing a workpiece in a vacuum plasma processor chamber wherein a gas species is converted into an AC plasma, the vacuum chamber being subject to operating at different pressures while the workpiece is being processed, the gas species being subject to flowing into the chamber at different flow rates while the workpiece is being processed, comprising, gradually changing on a pre-programmed basis, the amount of AC power supplied to the plasma during processing of the workpiece.

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