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Substrate processing unit

  • US 20020148566A1
  • Filed: 04/16/2002
  • Published: 10/17/2002
  • Est. Priority Date: 04/17/2001
  • Status: Active Grant
First Claim
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1. A processing unit for processing a substrate, comprising:

  • a chamber for housing the substrate and forming a hermetically closeable processing room;

    an exhauster for exhausting an atmosphere in the processing room from an upper portion of the chamber to reduce a pressure in the processing room; and

    a current plate for controlling an atmospheric current formed in the processing room when the pressure is reduced, wherein said chamber includes a mounting table for mounting the substrate thereon, an almost cylindrical lid body with its lower face open for covering the substrate on the mounting plate from above and forming the processing room integrally with the mounting table, and a supporting member for supporting said current plate in such a manner that said current plate is parallel to the mounting plate.

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