Wavefront aberration measuring method and unit, exposure apparatus, device manufacturing method, and device
First Claim
1. A wave-front aberration measuring method with which to measure a wave-front aberration in an optical system subject to measurement, said measuring method comprising:
- measuring, first, aberration components of a first set of order terms out of aberration components of order terms of a predetermined basis in which the wave-front aberration in said optical system is expanded;
calculating correction information for aberration components of a second set of order terms based on a predetermined order term'"'"'s aberration component out of the aberration components of said first set of order terms;
measuring aberration components of said second set of order terms in said optical system; and
correcting the result of said measuring of aberration components of said second set of order terms based on said correction information.
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Abstract
First, the wave-front aberration in an optical system PL subject to measurement is measured using a measuring system 70 according to a usual method. After that, by using calculated correction information for aberration components of a second set of order terms based on a model for the measuring system 70 and aberration components of a first set of order terms measured before, the result of measuring aberration components of the second set of order terms is corrected. As a result, aberration components of the second set of order terms can be accurately obtained, so that the wave-front aberration in the optical system subject to measurement is accurately obtained.
46 Citations
15 Claims
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1. A wave-front aberration measuring method with which to measure a wave-front aberration in an optical system subject to measurement, said measuring method comprising:
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measuring, first, aberration components of a first set of order terms out of aberration components of order terms of a predetermined basis in which the wave-front aberration in said optical system is expanded;
calculating correction information for aberration components of a second set of order terms based on a predetermined order term'"'"'s aberration component out of the aberration components of said first set of order terms;
measuring aberration components of said second set of order terms in said optical system; and
correcting the result of said measuring of aberration components of said second set of order terms based on said correction information. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A wave-front aberration measuring unit which measures a wave-front aberration in an optical system subject to measurement, said measuring unit comprising:
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a storage unit that stores calculated correction information for aberration components of a second set of order terms based on a predetermined order term'"'"'s aberration component out of aberration components of a first set of order terms measured before out of aberration components of order terms of a predetermined basis in which the wave-front aberration in said optical system is expanded;
a measuring system that measures aberration components of said second set of order terms of the wave-front aberration in said optical system; and
a correcting unit that corrects the measuring result of said measuring system with said correction information. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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Specification