Mechanically alloyed precious metal magnetic sputtering targets fabricated using rapidly solidified alloy powders and elemental Pt metal
First Claim
Patent Images
1. A precious metal magnetic sputtering target comprising Pt, Co, and at least 2 atomic % of at least one element selected from the group consisting of Cr, B, Ta, Nb, C, Mo, W, Zr, Zn, Cu, Hf, O, Si and N.
1 Assignment
0 Petitions
Accused Products
Abstract
A cobalt-chromium-boron-platinum sputtering target alloy having multiple phases. The alloy can include Cr, B, Ta, Nb, C, Mo, Ti, V, W, Zr, Zn, Cu, Hf, O, Si or N. The alloy is prepared by mixing Pt powder with a cobalt-chromium-boron master alloy, ball milling the powders and HIP'"'"'ing to densify the powder into the alloy.
-
Citations
10 Claims
- 1. A precious metal magnetic sputtering target comprising Pt, Co, and at least 2 atomic % of at least one element selected from the group consisting of Cr, B, Ta, Nb, C, Mo, W, Zr, Zn, Cu, Hf, O, Si and N.
- 7. A method of preparing a precious metal magnetic sputtering target comprising a multiphase alloy comprising Pt and a masteralloy comprising Co and at least 2 atomic % of at least one element selected from the group consisting of Cr, B, Ta, Nb, C, Mo, W, Zr, Zn, Cu, Hf, O, Si and N, said method comprising the steps of ball milling a powder of the masteralloy with Pt powder to mechanically alloy Pt to the master alloy and densifying the resultant alloy to form the sputtering target.
Specification