Sputtering system

• US 20020170822A1
• Filed: 02/15/2002
• Published: 11/21/2002
• Est. Priority Date: 02/15/2001
• Status: Active Grant

• Current Assignee: LG Display Co., Ltd.
• Original Assignee: LG Philips LCD Company Limited (LG Display Co., Ltd.)
• Inventors: Chang, Soo Chang
• Granted Patent: US 6,887,357 B2
• Time in Patent Office: Days
• US Class Current: 204/298.16
• CPC Class Codes: C23C 14/35 by application of a magnetic field, e.g. magnetron sputtering C23C14/3457 takes precedence
• CPC Class Codes: H01J 37/3402 using supplementary magnetic fields

Abstract

A sputtering system for depositing a thin film on a substrate includes a vacuum chamber, a support for supporting the substrate in the vacuum chamber, a target arranged to oppose the support, a fixed plate formed on a first side of the target, and a plurality of electromagnets formed on the fixed plate in a cell pattern.

Claims

1. A sputtering system for depositing a thin film on a substrate, comprising:

a vacuum chamber;

a support for supporting the substrate in the vacuum chamber;

a target arranged to oppose the support;

a fixed plate formed on a first side of the target; and

a plurality of electromagnets formed on the fixed plate in a cell pattern.

2. The system according to claim 1, wherein the plurality of electromagnets are individually controlled.

3. The system according to claim 1, wherein the cell pattern includes a plurality of groups of the electromagnets, each group being separately controlled.

4. The system according to claim 3, wherein the plurality of groups of the electromagnets includes at least a first group of the electromagnets having one of a triangular, pentagonal, and hexagonal array pattern.

5. The system according to claim 4, wherein the plurality of groups of the electromagnets includes at least a second group of the electromagnets having one of a triangular, pentagonal, and hexagonal array pattern.

6. The system according to claim 5, wherein the first group of the electromagnets is independently controlled from the second group of the electromagnets.

7. The system according to claim 1, wherein the cell pattern includes a matrix array pattern of the plurality of electromagnets.

8. The system according to claim 1, wherein the cell pattern includes a hexagonal array pattern of the plurality of electromagnets.