Cyclic error reduction in average interferometric position measurements

• US 20020171844A1
• Filed: 03/13/2002
• Published: 11/21/2002
• Est. Priority Date: 03/13/2001
• Status: Active Grant

• Current Assignee: Zygo Corporation (Ametek Incorporated)
• Original Assignee: Zygo Corporation (Ametek Incorporated)
• Inventors: Hill, Henry A.
• Granted Patent: US 6,891,624 B2
• Time in Patent Office: Days
• US Class Current: 356/500
• CPC Class Codes: G01B 2290/70 Using polarization in the interferometer
• CPC Class Codes: G01B 9/02003 using beat frequencies
• CPC Class Codes: G01B 9/02018 Multipass interferometers, e.g. double-pass
• CPC Class Codes: G01B 9/02059 Reducing effect of parasitic reflections, e.g. cyclic errors
• CPC Class Codes: G01B 9/02087 Combining two or more images of the same region
• CPC Class Codes: G03F 7/70775 Position control, e.g. interferometers or encoders for determining the stage position
• CPC Class Codes: H01J 2237/20292 Means for position and/or orientation registration

Abstract

The invention features a system and method for reducing the contribution of cyclic errors to an interferometric position measurement of a movable stage. An initial interferometric position measurement of the stage is averaged with at least one additional measurement corresponding to a displacement(s) of the stage from its initial position. The displacements are selected to reduce the overall cyclic error contribution to an average position measurement. As a result, the average position of the stage can be measured more accurately than any of its individual positions. The average position can be used to more accurately determine the average position of an alignment mark on a wafer carried by the stage. Furthermore, the averaging described above can be applied to additional interferometric measurement axes. For example, the averaging can be applied to two laterally displacement measurement axes that are substantially parallel to one another to more accurately determine an average angular orientation of the stage. The result can be used to more correctly determine an Abbe offset error in the average position of an off-axis alignment mark (i.e., an alignment mark that is not aligned with one of the interferometric measurement axes).

Claims

1. An interferometric stage system comprising:

a translatable stage;

a base defining a reference frame;

a positioning system coupled to the stage for adjusting the position of the stage relative to the reference frame;

an interferometry system which during operation directs a measurement beam along path between the stage and a portion of the base to produce an interferometric signal indicative of a position of the stage along the path, wherein a defect in the interferometry system produces a cyclic error contribution to the interferometric signal; and

an electronic controller coupled to the interferometry system and the positioning system, wherein during operation the electronic controller determines an average position for the stage along the first path based on the interferometric signal corresponding to each of multiple positions of the stage, wherein the multiple positions of the stage include an initial position and at least one additional position, and wherein the controller selects each of the additional positions to reduce the cyclic error contribution in the average position.

2. The system of claim 1, wherein during operation the electronic controller causes the positioning system to translate the stage to each of the additional positions.

3. The system of claim 1, wherein the interferometric signal for a particular position of the stage can be expressed by a measured phase {tilde over (φ

)}, where

4. The system of claim 3, wherein the m=1, p=1 cyclic error term is the dominant term in the cyclic error contribution and wherein the at least one additional position selected by the electronic controller consists of one additional position corresponding to the measured phase {tilde over (φ

)}₁={tilde over (φ

)}₀+π

+2π

n₁, wherein n₁=1.

5. The system of claim 3, wherein the m=1, p=2 cyclic error term is the dominant term in the cyclic error contribution and wherein the at least one additional position selected by the electronic controller consists of one additional position corresponding to the measured phase {tilde over (φ

)}₁={tilde over (φ

)}₀+π

+2π

+4π

n₁, wherein n₁=1.

6. The system of claim 3, wherein the m=2, p=1 cyclic error term is the dominant term in the cyclic error contribution and wherein the at least one additional position selected by the electronic controller consists of one additional position corresponding the measured phase {tilde over (φ

)}₁={tilde over (φ

)}₀+π

/2+π

n₁, wherein n₁=1.

7. The system of claim 3, wherein the additional positions selected by the electronic controller comprise positions corresponding to the measured phases {tilde over (φ

)}₀+π

+4π

n₁, {tilde over (φ

)}₀+2π

+4π

n₂, and {tilde over (φ

)}₀+3π

+4π

n₃, for integers n₁, n₂, and n₃.

8. The system of claim 3, wherein the additional positions selected by the electronic controller comprise positions corresponding to the measured phases {tilde over (φ

)}₀+π

/2+2π

n₁, {tilde over (φ

)}₀+π

+2π

n₂, and {tilde over (φ

)}₀+3π

/2+2π

n₃, for integers n₁, n₂, and n₃.

9. The system of claim 3, wherein the additional positions selected by the electronic controller comprise positions corresponding to the measured phases {tilde over (φ

)}₀+π

/2+4π

n₁, {tilde over (φ

)}₀+π

+4π

n₂, {tilde over (φ

)}₀+3π

/2+4π

n₃, {tilde over (φ

)}₀+2π

+4π

n₄, {tilde over (φ

)}₀+5π

/2+4π

n₅, {tilde over (φ

)}₀+3π

+4π

n₆, {tilde over (φ

)}₀+7π

/2+4π

n₇, for integers n₁, n₂, n₃, n₄, n₅, n₆, and n₇.

10. The system of claim 3, wherein the average position is linearly proportional to the average of the measured phases corresponding to the multiple positions.

11. The system of claim 1, wherein the electronic controller determines the average position by applying a digital filter to the interferometric signals corresponding to the multiple positions.

12. The system of claim 1, further comprising an alignment scope coupled to the electronic controller, wherein during operation the electronic controller determines whether an alignment mark on a wafer carried by the stage is within view of the alignment scope, and wherein the initial positions and the additional positions selected by the electronic controller are positions in which the alignment mark is within the view of the alignment scope.

13. The system of claim 1, wherein during operation the electronic controller determines a second average position of the stage corresponding to a second set of multiple positions of the stage, and wherein the electronic controller further determines a speed for the stage based on the first-mentioned average position and the second average position.

14. The system of claim 1, wherein during operation the interferometry system directs a second measurement beam along a second path between the stage and the portion of the base to produce a second interferometric signal indicative of a position of the stage along the second path.

15. The system of claim 14, wherein the interferometry system comprises two separate interferometers, the first interferometer directing the first measurement beam and the second interferometer directing the second measurement beam.

16. The system of claim 14, wherein the interferometry system comprises a multi-axis interferometer providing measurement axes along the first and second paths.

17. The system of claim 14, wherein during operation the electronic controller determines an average position of the stage along the second path based on the second interferometric signal corresponding to each of the multiple positions of the stage.

18. The system of claim 17, wherein the first and second paths are parallel to one another.

19. The system of claim 18, wherein during operation the electronic controller determines an angular orientation for the stage based on the average position of the stage along the first path and the average position of the stage along the second path.

20. The system of claim 19, wherein translation of the stage to each of the additional positions causes the first and second interferometric signals to change by the same amount relative to the first and second interferometric signals for the initial position.

21. The system of claim 19, further comprising an alignment scope coupled to the electronic controller, wherein during operation the electronic controller determines whether an alignment mark on a wafer carried by the stage is within view of the alignment scope, and wherein the initial position and the additional positions selected by the electronic controller are positions in which the alignment mark is within the view of the alignment scope.

22. The system of claim 21, wherein the electronic controller further determines an Abbe offset error for the alignment mark based on the angular orientation determined by the processor and an off-set distance corresponding to a lateral displacement between the alignment mark and the first measurement beam path.

23. The system of claim 1, wherein the interferometry system comprises an interferometer secured to the portion of the base and a measurement object secured to the stage, wherein during operation the interferometer directs the measurement beam to reflect from the measurement object.

24. The system of claim 1, wherein the interferometry system comprises an interferometer secured to the stage and a measurement object secured to the portion of the base, wherein during operation the interferometer directs the measurement beam to reflect from the measurement object.

25. The system of claim 1, wherein during operation the interferometry system directs the measurement beam to pass between the stage and the portion of the base more than once.

27. The method of claim 26, wherein the interferometric signal for a particular position of the stage can be expressed by a measured phase {tilde over (φ

)}, where

28. The method of claim 27, wherein the m=1, p=1 cyclic error term is the dominant term in the cyclic error contribution and wherein the at least one selected additional position consists of one additional position corresponding to the measured phase {tilde over (φ

)}₁={tilde over (φ

)}₀+π

+2π

n₁, wherein n₁=1.

29. The method of claim 27, wherein the m=1, p=2 cyclic error term is the dominant term in the cyclic error contribution and wherein the at least one selected additional position consists of one additional position corresponding to the measured phase {tilde over (φ

)}₁={tilde over (φ

)}₀+2π

+4π

n₁, wherein n₁=1.

30. The method of claim 27, wherein the m=2, p=1 cyclic error term is the dominant term in the cyclic error contribution and wherein the at least one selected additional position consists of one additional position corresponding the measured phase {tilde over (φ

)}₁={tilde over (φ

)}₀+π

/2+π

n₁, wherein n_i=1.

31. The method of claim 27, wherein the selected additional positions comprise positions corresponding to the measured phases {tilde over (φ

)}₀+π

+4π

n₁, {tilde over (φ

)}₀+2π

+4π

n₂, and {tilde over (φ

)}₀+π

/2+2π

n₃, for integers n₁, n₂, and n₃.

32. The method of claim 27, wherein the selected additional positions comprise positions corresponding to the measured phases {tilde over (φ

)}₀+π

/2+2π

n₂, {tilde over (φ

)}₀+π

+2π

n₂, and {tilde over (φ

)}₀+3π

/2+2π

n₃, for integers n₁, n₂, and n₃.

33. The method of claim 27, wherein the selected additional positions comprise positions corresponding to the measured phases {tilde over (φ

)}₀+π

/2+4π

n₁, {tilde over (φ

)}₀+π

+4π

n₂, {tilde over (φ

)}₀+3π

/2+4π

n₃, {tilde over (φ

)}₀+2π

+4π

n₄, {tilde over (φ

)}₀+5π

/2+4π

n₅, {tilde over (φ

)}₀+3π

+4π

n₆, and {tilde over (φ

)}₀+7π

/2+4π

n₇, for integers n₁, n₂, n₃, n₄, n₅, n₆, and n₇.

34. The method of claim 27, wherein determining the average position comprises averaging the measured phases corresponding to the additional positions.

35. The method of claim 34, wherein averaging the measured phases comprises applying a digital filter to the interferometric signals corresponding to the multiple positions.

36. The method of claim 26, further comprising determining whether an alignment mark on a wafer carried by the stage is within view of an alignment scope, and wherein the initial position and the selected additional positions are positions in which the alignment mark is within the view of the alignment scope.

37. The method of claim 26, further comprising:

determining a second average position of the stage corresponding to a second set of multiple positions of the stage, and

determining a speed for the stage based on the first-mentioned average position and the second average position.

38. The method of claim 26, further comprising:

generating a second interferometric signal for each of the multiple positions, wherein the second interferometric signal is indicative of the stage position along a second path; and

determining an average position of the stage along the second path based on the second interferometric signals.

39. The method of claim 38, wherein the first and second paths are parallel to one another.

40. The method of claim 38, further comprising determining an angular orientation for the stage based on the average position of the stage along the first path and the average position of the stage along the second path.

41. The method of claim 40, wherein translation of the stage to each of the additional positions causes the first and second interferometric signals to change by the same amount relative to the first and second interferometric signals for the initial position.

42. The method of claim 40, further comprising determining whether an alignment mark on a wafer carried by the stage is within view of an alignment scope, and wherein the initial position and the selected additional positions are positions in which the alignment mark is within the view of the alignment scope.

43. The method of claim 42, further comprising determining an Abbe offset error for the alignment mark based on the angular orientation and an off-set distance corresponding to a lateral displacement between the alignment mark and the first path.

26. An interferometric method comprising:

generating an interferometric signal for each of multiple positions of the stage, wherein the interferometric signal indicates the stage position along a first path and wherein the multiple positions of the stage include an initial position and at least one additional position;

determining an average position for the stage based on the interferometric signal corresponding to each of multiple positions; and

selecting the at least one additional position to reduce a cyclic error contribution from the interferometric signal in the average position.