Microelectronic system and method of use and fabrication

• US 20020179439A1
• Filed: 05/31/2001
• Published: 12/05/2002
• Est. Priority Date: 05/31/2001
• Status: Abandoned Application

• Current Assignee: Asia Bioinnovations Corporation
• Original Assignee: Asia Bioinnovations Corporation
• Inventors: Ho, Ching, Chen, Jenn-Han, Weng, Tsu-Tseng
• Application Number:
  US09/871,209
• Publication Number:
  US 20020179439A1
• Time in Patent Office: Days
• US Class Current: 204/400
• CPC Class Codes: B01J 19/0046 Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays synthesis methods per se C40B50/00
• CPC Class Codes: B01J 2219/00369 in multiple or parallel arrangements
• CPC Class Codes: B01J 2219/00432 Photolithographic masks
• CPC Class Codes: B01J 2219/00527 Sheets
• CPC Class Codes: B01J 2219/00574 radioactive
• CPC Class Codes: B01J 2219/00576 fluorophore
• CPC Class Codes: B01J 2219/00585 Parallel processes
• CPC Class Codes: B01J 2219/00653 the compounds being bound to electrodes embedded in or on the solid supports
• CPC Class Codes: B01J 2219/00659 Two-dimensional arrays
• CPC Class Codes: B01J 2219/00722 Nucleotides
• CPC Class Codes: B81C 3/00 Assembling of devices or systems from individually processed components
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: C40B 40/06 Libraries containing nucleotides or polynucleotides, or derivatives thereof
• CPC Class Codes: C40B 60/14 for creating libraries

Abstract

The invention provides a microelectronic system, which can actively carry out and control molecular biological reactions in microscopic formats. The microelectronic system is accomplished by using electrochemical detection for bulge sites in binding pairs, in order to enhance sensitivity without marking the probe with reporter groups. Together with electrical stringency control, the method can be fully automated with minimum sample preparation. The present invention is especially useful for diagnosing base pair mismatches in target sequences by using specific metal complexes for detection.

Claims

1. A microelectronic system, wherein the microelectronic system includes a reaction region, the system comprising:

a plurality of micro-locations distributed in the reaction region, wherein each micro-location comprises;

a first electrode disposed in a center of the micro-location;

a second electrode surrounding the first electrode with a distance, thus enclosing a space, wherein the second electrode is electrically insulated from the first electrode without loaded fluid;

an attachment layer coupled to a surface of the first electrode;

a plurality of binding entities coupled the attachment layer, wherein the binding entities are immobilized onto the surface of the first electrode through the attachment layer; and

a permeation layer for supporting the binding entities

,wherein the second electrodes isolate the first electrodes, acting as isolating walls, and wherein the space enclosed by the second electrode can hold loaded fluid;

a retaining wall around the reaction region;

a plurality of contact pads disposed outside the reaction region and surrounding the reaction region, for electrical operation;

a connective circuitry for connecting the first electrodes in the micro-locations and the contact pads;

an insulating layer for isolating the micro-locations and the connective circuitry, wherein the micro-locations are disposed on a first surface of the insulating layer and using the insulating layer as a base for the micro-locations, while a second surface of the insulating, opposite to the first surface, is attached to the connective circuitry; and

a cap layer over the micro-locations for sealing the micro-locations.

2. The microelectronic system as claimed in claim 1, wherein a substrate attached to the connective circuitry can be further included for support.

3. The microelectronic system as claimed in claim 2, wherein a material for forming the substrate can be selected from the group consisting of glass, plastic, polyester (PET), polyimide (PI), polystyrene (PS) and ceramic materials.

4. The microelectronic system as claimed in claim 1, wherein a reference electrode applied to each micro-location can be further included for electrochemical detection.

5. The microelectronic system as claimed in claim 1, wherein a solution, including a test sample, a redox-active mediator and an oxidant, can be further included in each micro-location.

6. The microelectronic system as claimed in claim 5, wherein the redox-active mediator is a metal complex compound for assisting electrochemical detection.

7. The microelectronic system as claimed in claim 6, wherein the metal complex compound can be selected from the group consisting of cobalt (II) (hexaazacyclophane)(trifuoroacetate)₂, cobalt (II) (hexaazacyclophane)(H2O) (trifuoroacetate), ruthenium (II) (hexaazacyclophane) (trifuoroacetate)₂, and manganese (II) (hexaazacyclophane) (trifuoroacetate)₂.

8. The microelectronic system as claimed in claim 5, wherein the oxidant is hydrogen peroxide.

9. The microelectronic system as claimed in claim 1, wherein a power supply can be further included.

10. The microelectronic system as claimed in claim 1, wherein a material for forming the insulating layer can be selected from the group consisting of plastic, polyester (PET), polyimide (PI), polystyrene (PS) and glass materials.

11. The microelectronic system as claimed in claim 1, wherein a material for forming the first electrode can be copper.

12. The microelectronic system as claimed in claim 1, wherein a material for forming the first electrode can be selected from the group consisting of copper, gold, silver, tin, aluminum, platinum, palladium, and metal alloys of previous metals.

13. The microelectronic system as claimed in claim 1, wherein a material for forming the second electrode can be copper.

14. The microelectronic system as claimed in claim 1, wherein a material for forming the second electrode can be selected from the group consisting of copper, gold, silver, tin, aluminum, platinum, palladium, and metal alloys of previous metals.

16. The method as claimed in claim 15, wherein before the step of forming a retaining wall, the method further comprises attaching a substrate to the connective circuitry of the three-layered structure.

17. The method as claimed in claim 16, wherein a material for forming the substrate can be selected from the group consisting of glass, plastic, polyester (PET), polyimide (PI), polystyrene (PS) and ceramic materials.

18. The method as claimed in claim 15, wherein the step of attaching binding entities to the working electrodes further comprises the following steps:

providing a first solution, including the binding entities and attachment agents to the hole in the first layer, so that the first solution is in contact with the working electrode in the hole;

applying a first bias to the working electrode and a second bias to the electrode;

attaching the binding entities to a surface of the working electrode in a self-assembly style by the attachment agents; and

repelling the unattached binding entities from the working electrode.

19. The method as claimed in claim 18, wherein the first bias and the second bias are opposite biases.

20. The method as claimed in claim 18, wherein the first solution can further comprises permeation agents.

21. The method as claimed in claim 15, wherein a material for forming the third layer can be selected from the group consisting of plastic, polyester (PET), polyimide (PI), polystyrene (PS) and glass materials.

22. The method as claimed in claim 15, wherein a material for forming the first layer can be copper.

23. The method as claimed in claim 15, wherein a material for forming the first layer can be selected from the group consisting of copper, gold, silver, tin, aluminum, platinum, palladium, and metal alloys of previous metals.

24. The method as claimed in claim 15, wherein a material for forming the second layer can be copper.

25. The method as claimed in claim 15, wherein a material for forming the second layer can be selected from the group consisting of copper, gold, silver, tin, aluminum, platinum, palladium, and metal alloys of previous metals.

26. The method as claimed in claim 15, wherein the step of forming a plurality of first and second plugs comprises performing a through-hole electroplating process.

27. The method as claimed in claim 15, wherein the step of performing a drilling process comprises performing a drilling process assisted by laser-alignment.

29. The microelectronic system as claimed in claim 28, wherein the redox-active mediator is a metal complex compound for detecting the bulge site.

30. The microelectronic system as claimed in claim 29, wherein the metal complex compound can be selected from the group consisting of cobalt (II) (hexaazacyclophane)(trifuoroacetate)₂, cobalt (II) (hexaazacyclophane)(H2O) (trifuoroacetate), ruthenium (II) (hexaazacyclophane) (trifioroacetate)₂, and manganese (II) (hexaazacyclophane) (trifuoroacetate)₂.

31. The microelectronic system as claimed in claim 28, wherein the oxidant is hydrogen peroxide.

32. The microelectronic system as claimed in claim 28, wherein a power supply can be further included.

33. The microelectronic system as claimed in claim 28, wherein a material for forming the insulating layer can be selected from the group consisting of plastic, polyester (PET), polyimide (PI), polystyrene (PS) and glass materials.

34. The microelectronic system as claimed in claim 28, wherein a material for forming the first electrode can be selected from the group consisting of copper, gold, silver, tin, aluminum, platinum, palladium, and metal alloys of previous metals.

35. The microelectronic system as claimed in claim 28, wherein a material for forming the second electrode can be selected from the group consisting of copper, gold, silver, tin, aluminum, platinum, palladium, and metal alloys of previous metals.

15. A method for fabricating a microelectronic system, compatible with electrochemical detection, the method comprising:

providing a three-layered structure, wherein the three-layered structure comprises a first layer, a second layer and a third layer between the first and second layers stacked together, and wherein the first layer has a central reaction region and a outer region surrounding the central reaction region;

forming a first patterned photoresist layer and a second patterned photoresist layer respectively on the first layer and the second layer;

patterning the first layer to form a plurality of holes in the central reaction region and form a plurality of blocks in the outer region, wherein the remained portion of the first layer in the central reaction region serves as a electrode;

patterning the second layer to form a connective circuitry;

performing a drilling process to form a plurality of first boreholes and second boreholes through the three-layered structure, wherein each first bore is disposed in a center of each hole, while each second bore is disposed in a center of each block;

forming a plurality of first plugs and second plugs to respectively fill up the first and second boreholes, while forming a plurality of first bulges and second bulges respectively on opening of the first and second boreholes on the first layer, wherein the first bulges on the first layer serve as working electrodes and the second bulges on the first layer serve as contact pads, wherein the first and second plugs connect the connective circuitry with the working electrodes and the contact pads;

removing the patterned first and second photoresist layers;

performing surface treatment to exposed surfaces of the three-layered structure;

forming a retaining wall around the reaction region and on the first layer;

attaching binding entities to the working electrodes; and

forming a cap layer to cover the first layer in the central reaction region, so that the central reaction region is sealed.

28. A microelectronic system for detecting a bulge site, wherein the microelectronic system includes a reaction region, the system comprising:

a plurality of micro-locations distributed in the reaction region, wherein each micro-location comprises;

a first electrode disposed in a center of the micro-location;

a second electrode surrounding the first electrode with a distance, thus enclosing a space, wherein the second electrode is electrically insulated from the first electrode without loaded fluid;

an attachment layer coupled to a surface of the first electrode;

a plurality of binding entities coupled the attachment layer, wherein the binding entities are immobilized onto the surface of the first electrode through the attachment layer; and

a permeation layer for supporting the binding entities

, wherein the second electrodes isolate the first electrodes, acting as isolating walls, and wherein the space enclosed by the second electrode can hold loaded fluid;

a retaining wall around the reaction region;

a plurality of contact pads disposed outside the reaction region and surrounding the reaction region, for electrical operation;

a connective circuitry for connecting the first electrodes in the micro-locations and the contact pads;

an insulating layer for isolating the micro-locations and the connective circuitry, wherein the micro-locations are disposed on a first surface of the insulating layer and using the insulating layer as a base for the micro-locations, while a second surface of the insulating, opposite to the first surface, is attached to the connective circuitry;

a cap layer over the micro-locations for sealing the micro-locations in the reaction region;

a solution, including a plurality of test sample molecules, a redox-active mediator and an oxidant, added to the micro-locations in the sealed reaction region, wherein the test sample molecule can form a binding pair with the binding entity, thus forming a bulge site; and

a reference electrode applied to the micro-location for detecting the bulge site through the redox-active mediator.