Exposure apparatus

• US 20020191163A1
• Filed: 06/13/2002
• Published: 12/19/2002
• Est. Priority Date: 06/15/2001
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Hasegawa, Noriyasu, Terashima, Shigeru
• Granted Patent: US 6,721,031 B2
• Time in Patent Office: Days
• US Class Current: 355/30
• CPC Class Codes: G03B 27/52 Details
• CPC Class Codes: G03F 7/70933 Purge, e.g. exchanging fluid or gas to remove pollutants

Abstract

This invention shortens a time required to purge, with inert gas, gas in a space (optical path space) through which exposure light passes, such as a space between a projection optical system and a substrate. The exposure apparatus includes a wafer stage (102), a projection optical system (101), and an air supply portion (112) which supplies inert gas at a nonuniform flow velocity to an optical path space (113) through which exposure light passes between the wafer stage (102) and the projection optical system (101). A downward flow of inert gas is formed.

Claims

1. An exposure apparatus which projects and transfers a pattern formed on a mask to a substrate by using exposure light, comprising:

a stage;

an optical system; and

a gas flow formation mechanism which forms a flow of inert gas in an optical path space including a space through which exposure light passes between said stage and said optical system,

wherein said gas flow formation mechanism is arranged to form a flow of inert gas having a spatially or temporarily nonuniform distribution in the optical path space.

2. The apparatus according to claim 1, wherein said gas flow formation mechanism is arranged to form a flow of inert gas having a nonuniform flow velocity distribution in the optical path space.

3. The apparatus according to claim 2, wherein said gas flow formation mechanism comprises a supply mechanism which supplies inert gas to the optical path space, and said supply mechanism is arranged to supply inert gas having a nonuniform flow velocity distribution to the optical path space.

4. The apparatus according to claim 2, wherein said gas flow formation mechanism comprises

a supply mechanism which supplies inert gas to the optical path space, and

an exhaust mechanism which exhausts gas containing inert gas from the optical path space, and

said exhaust mechanism is arranged to exhaust the gas containing the inert gas from the optical path space so as to form a nonuniform flow velocity distribution in the optical path space.

5. The apparatus according to claim 2, wherein the nonuniform flow velocity distribution includes a distribution in which a flow velocity is higher at a portion closer to said optical system.

6. The apparatus according to claim 2, wherein the nonuniform flow velocity distribution includes a distribution in which a flow velocity is higher at a portion closer to an optical axis of said optical system.

7. The apparatus according to claim 2, wherein said supply mechanism comprises two gas supply portions arranged at positions opposite to each other via the optical path space.

8. The apparatus according to claim 1, wherein said gas flow formation mechanism comprises a supply mechanism which supplies inert gas to the optical path space, and said supply mechanism changes a flow rate of inert gas supplied to the optical path space along with a lapse of time.

9. The apparatus according to claim 1, wherein said gas flow formation mechanism comprises two gas supply portions arranged at positions opposite to each other via the optical path space.

10. The apparatus according to claim 1, wherein said gas flow formation mechanism comprises at least two gas supply portions arranged at positions around the optical path space.

11. The apparatus according to claim 1, wherein said gas flow formation mechanism comprises at least two supply mechanisms which supply inert gas to the optical path space, and said at least two supply mechanisms are arranged to supply different supply amounts of inert gas from said respective supply mechanisms or to change flow rates of inert gas supplied from said respective supply mechanisms along with a lapse of time.

12. The apparatus according to claim 11, wherein said gas flow formation mechanism comprises at least two supply mechanisms which supply inert gas to the optical path space, and said at least two supply mechanisms are arranged to change flow rates of inert gas supplied from said at least two supply mechanisms to the optical path space along with a lapse of time while a sum of the flow rates of inert gas supplied from said at least two supply mechanisms to the optical path space is kept substantially constant.

13. The apparatus according to claim 1, wherein said gas flow formation mechanism is arranged to change a flow of inert gas formed in the optical path space in accordance with a change in positional relationship between said stage and the optical path space.

14. The apparatus according to claim 1, wherein said gas flow formation mechanism comprises

a supply mechanism which supplies inert gas to the optical path space, and

an exhaust mechanism which exhausts gas containing inert gas from the optical path space, and

said supply mechanism and said exhaust mechanism are arranged to change a supply amount and an exhaust amount in accordance with a change in positional relationship between said stage and the optical path space.

15. The apparatus according to claim 1, wherein said gas flow formation mechanism evacuates the optical path space by a predetermined exhaust amount when a predetermined region of said stage starts to enter the optical path space, and decreases the exhaust amount after the predetermined region of said stage completely enters the optical path space.

16. The apparatus according to claim 1, wherein said gas flow formation mechanism evacuates the optical path space by a predetermined exhaust amount when a predetermined region of said stage starts to enter the optical path space, and stops exhaust after the predetermined region of said stage completely enters the optical path space.

17. The apparatus according to claim 1, wherein said gas flow formation mechanism comprises

a supply mechanism which supplies inert gas to the optical path space, and

a supply/exhaust mechanism which supplies inert gas to the optical path space or exhausts gas containing inert gas from the optical path space, and

said gas flow formation mechanism causes said supply mechanism to supply inert gas to the optical path space and operates said supply/exhaust mechanism as an exhaust mechanism when a predetermined region of said stage starts to enter the optical path space, and operates said supply/exhaust mechanism as an air supply mechanism after a lapse of predetermined time.

18. The apparatus according to claim 2, wherein said gas flow formation mechanism comprises

a plurality of flow rate controllers, and

a plurality of air supply ports respectively connected to said plurality of flow rate controllers, and

said plurality of flow rate controllers are arranged to form a nonuniform flow velocity distribution.

19. The apparatus according to claim 2, wherein said gas flow formation mechanism forms a nonuniform flow velocity distribution by a plurality of filters having different pressure losses.

20. The apparatus according to claim 1, further comprising a shielding portion which separates at least part of a side plane of the optical path space from an ambient space around the optical path space.

21. The apparatus according to claim 1, further comprising a shielding portion which separates a plane having no gas flow formation mechanism out of side planes of the optical path space from an ambient space around the optical path space.

22. The apparatus according to claim 2, wherein the nonuniform flow velocity distribution includes a distribution in which a flow velocity is higher at a periphery apart from an optical axis of said optical system.

23. The apparatus according to claim 22, wherein said gas flow formation mechanism comprises

a plurality of flow rate controllers, and

a plurality of air supply ports respectively connected to said plurality of flow rate controllers, and

said plurality of flow rate controllers are arranged to form a nonuniform flow velocity distribution.

24. The apparatus according to claim 22, wherein said gas flow formation mechanism comprises a plurality of air supply ports arranged to supply inert gas in a predetermined direction, and an outer air supply port out of the plurality of air supply ports projects in the predetermined direction.

25. The apparatus according to claim 22, wherein said gas flow formation mechanism comprises

a supply mechanism which supplies inert gas to the optical path space, and

an exhaust mechanism which exhausts gas containing inert gas from the optical path space, and

said exhaust mechanism is arranged at a position opposite to said supply mechanism via the optical path space.

26. The apparatus according to claim 22, wherein said gas flow formation mechanism comprises two gas supply portions arranged at positions opposite to each other via the optical path space.

27. The apparatus according to claim 26, wherein said gas flow formation mechanism comprises two gas exhaust portions arranged at positions opposite to each other via the optical path space.

28. The apparatus according to claim 25, further comprising a wall arranged at a position opposite to said supply mechanism via a center of the optical path space with a surface of said wall facing to the center.

29. The apparatus according to claim 22, further comprising a shielding portion which separates at least part of a side plane of the optical path space from an ambient space around the optical path space.

30. The apparatus according to claim 22, further comprising a shielding portion which separates a plane having no gas flow formation mechanism out of side planes of the optical path space from an ambient space around the optical path space.

31. The apparatus according to claim 29, wherein said shielding portion is formed by a flow of inert gas.

32. The apparatus according to claim 1, wherein said gas flow formation mechanism supplies inert gas to the optical path space so as to adjust the optical path space to a positive pressure with respect to an ambient space.

33. The apparatus according to claim 21, wherein at least part of said shielding portion is formed from a member which transmits alignment light.

34. The apparatus according to claim 1, further comprising:

a substrate stage;

a substrate chuck mounted on said substrate stage; and

a member which smoothens a change in level between a substrate chucked by said substrate chuck and an ambient portion.

35. The apparatus according to claim 20, wherein said shielding portion which surrounds the optical path space is arranged to partially change a length from an end of said shielding portion to the substrate.

36. The apparatus according to claim 1, wherein said gas flow formation mechanism is arranged to form a flow of inert gas in an optical path space between a projection optical system and the substrate.

37. The apparatus according to claim 1, wherein said gas flow formation mechanism is arranged to form a flow of inert gas in an optical path space between an illumination system which illuminates the mask and a mask stage which holds the mask.

38. The apparatus according to claim 1, wherein said gas flow formation mechanism is arranged to form a flow of inert gas in an optical path space between a mask stage which holds the mask and a projection optical system.

39. The apparatus according to claim 1, wherein said gas flow formation mechanism comprises

a first gas flow formation mechanism arranged to form a flow of inert gas in a first optical path space between a projection optical system and the substrate,

a second gas flow formation mechanism arranged to form a flow of inert gas in a second optical path space between an illumination system which illuminates the mask and a mask stage which holds the mask, and

a third gas flow formation mechanism arranged to form a flow of inert gas in a third optical path space between the mask stage and the projection optical system.

40. The apparatus according to claim 1, wherein the inert gas includes nitrogen gas or helium gas.

41. A device manufacturing method comprising the steps of:

transferring a pattern to a substrate coated with a photosensitive material by using an exposure apparatus; and

developing the substrate,

wherein the exposure apparatus is arranged to project and transfer a pattern formed on the mask to the substrate by using exposure light,

the exposure apparatus comprises

a stage,

an optical system, and

a gas flow formation mechanism which forms a flow of inert gas in an optical path space including a space through which exposure light passes between the stage and the optical system, and

the gas flow formation mechanism forms a flow of inert gas having a spatially or temporarily nonuniform distribution in the optical path space.