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OPTICAL MARKER LAYER FOR ETCH ENDPOINT DETERMINATION

  • US 20020192845A1
  • Filed: 06/14/2001
  • Published: 12/19/2002
  • Est. Priority Date: 06/14/2001
  • Status: Active Grant
First Claim
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1. A method of forming an optical marker layer for etch endpoint determination, comprising:

  • forming a first carbon-containing layer on a substrate;

    forming an optical marker layer on the first carbon-containing layer by positioning the substrate in a process chamber, providing an optical marker-containing atmosphere to the process chamber, and treating the first carbon-containing layer with the optical marker-containing atmosphere to incorporate the optical marker therein; and

    forming a second carbon-containing layer on the optical marker layer.

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