Method of reducing resistance for conductive film formed on base material
First Claim
1. A method of reducing resistance for a conductive film made of metal oxide formed on a base material, comprising a UV light irradiation process on the film in vacuum or in an atmosphere of reducing gas at a temperature maintained between 25°
- C. and 300°
C.
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Accused Products
Abstract
A method of reducing resistance for a conductive film based on simple process at low temperatures, particularly a method of reducing resistance for a conductive film formed on a base of plastic resins is provided. A method of reducing resistance for a conductive film formed on a base material includes a treating process, in which a conductive film made of metal oxide is formed on a base material and irradiated with UV light in vacuum or in an atmosphere of reducing gas maintaining the temperature between 25° C. and 300° C.
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Citations
18 Claims
- 1. A method of reducing resistance for a conductive film made of metal oxide formed on a base material, comprising a UV light irradiation process on the film in vacuum or in an atmosphere of reducing gas at a temperature maintained between 25°
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15. A laminated material comprising a plastic base and crystalline metal oxide containing indium oxide and tin oxide that is formed and treated for reducing resistance on the plastic base.
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18. A substrate for a device comprising a laminated material that contains a plastic base and crystalline metal oxide containing indium oxide and tin oxide that is formed and treated for reducing resistance on the plastic base.
Specification