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Method of reducing resistance for conductive film formed on base material

  • US 20030003303A1
  • Filed: 12/13/2001
  • Published: 01/02/2003
  • Est. Priority Date: 06/28/2001
  • Status: Active Grant
First Claim
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1. A method of reducing resistance for a conductive film made of metal oxide formed on a base material, comprising a UV light irradiation process on the film in vacuum or in an atmosphere of reducing gas at a temperature maintained between 25°

  • C. and 300°

    C.

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