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Method and apparatus for tuning a plurality of processing chambers

  • US 20030003696A1
  • Filed: 06/29/2001
  • Published: 01/02/2003
  • Est. Priority Date: 06/29/2001
  • Status: Abandoned Application
First Claim
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1. A substrate processing apparatus, comprising:

  • one or more chamber bodies defining at least a first processing region and a second processing region therein; and

    a gas distribution system coupled to the processing regions, comprising;

    a first gas supply circuit coupled between the first processing region and the second processing region and adapted to supply a first process gas thereto;

    a second gas supply circuit coupled to first processing region and adapted to supply a second process gas thereto; and

    a third gas supply circuit coupled to second processing region and adapted to supply a third process gas thereto.

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