Automatic focusing system for scanning electron microscope equipped with laser defect detection function

• US 20030006372A1
• Filed: 06/13/2002
• Published: 01/09/2003
• Est. Priority Date: 06/19/2001
• Status: Active Grant

• Current Assignee: Hitachi High-Tech Science Corporation (Hitachi, Ltd.)
• Original Assignee: Seiko Instruments Incorporated (Seiko Group)
• Inventors: Sato, Mitsuyoshi, Morita, Seiji, Uemoto, Atsushi
• Granted Patent: US 6,621,082 B2
• Time in Patent Office: Days
• US Class Current: 250/310
• CPC Class Codes: H01J 2237/216 Automatic focusing methods
• CPC Class Codes: H01J 37/21 Means for adjusting the focus adjusting the focus while observing the image by photographic or optical means H01J37/22; means for observing the object or the point of impact on the object in tubes for the localised treatment of materials H01J37/3005
• CPC Class Codes: H01J 37/226 Optical arrangements for illuminating the object; optical arrangements for collecting light from the object

Abstract

A scanning electron microscope equipped with a laser defect detection function has an automatic focusing function that performs the steps of: obtaining a deviation (offset) amount between focal positions of an optical microscope and a scanning electron microscope; detecting a defect by a laser dark-field image of the optical microscope; analyzing the dark-field image to readjust a focus of the optical microscope to adjust a height of the optical microscope; and automatically adjusting a focus of the scanning electron microscope by adding a readjusted amount of the focus of the optical microscope to the offset amount before an observation is conducted by the scanning electron microscope.

Claims

1. An automatic focusing method used by a scanning electron microscope equipped with a laser defect detection function, the method comprising:

obtaining an accurate offset amount between focal positions of an optical microscope and a scanning electron microscope;

detecting a defect by a laser dark-field image provided by the optical microscope;

analyzing the dark-field image to readjust a focus of the optical microscope;

automatically adjusting a focus of the scanning electron microscope by adding a readjusted amount of the focus of the optical microscope to the offset amount before an observation is conducted by the scanning electron microscope.

2. An automatic focusing method of a scanning electron microscope equipped with a laser defect detection function according to claim 1, wherein the step of analyzing the dark-field image to readjust a focus of the optical microscope comprises one of a step of seeking a minimum defect area, a step of seeking a defect area having a brightest luminance, a step of seeking a defect area that provides a maximum differential value obtained as a result of differential scanning of the dark-field image on a screen of the optical microscope, and a step that combines the steps.

3. A particle defect examination apparatus comprising a scanning electron microscope equipped with a laser defect detection function by use of an optical microscope, the particle defect examination apparatus comprising:

a storage device that stores an accurate offset amount between focal positions of the optical microscope and the scanning electron microscope;

an analysis device that performs an analysis to find a focused position of the optical microscope based on a laser dark-field image obtained by the optical microscope; and

a device that automatically adjusts a focus of the scanning electron microscope by adding a readjusted amount of the focus of the optical microscope to the offset amount.

4. A particle defect examination apparatus according to claim 3, wherein the optical microscope and the scanning electron microscope are located adjacent to a sample stage equipped with a driving system having at least three (x, y and z) axial directions of movements.

5. A particle defect examination apparatus according to claim 3, wherein the analysis device selects one of a mode of seeking a minimum defect area, a mode of seeking a defect area having a brightest luminance, a mode of seeking a defect area that provides a maximum differential value as a result of differential scanning of the dark-field image on a screen on the optical microscope, and a mode that combines the modes.

6. A particle defect examination apparatus according to claim 3 wherein the analysis device selects one of a mode that extracts one defect on the screen, a mode that extracts a plurality of defects on the screen, and a mode that extracts all defects on the screen.

7. A particle defect examination apparatus according to claim 3, wherein the analysis device includes a device that extracts one defect from the laser dark-field image on the screen.

8. A particle defect examination apparatus according to claim 3, wherein the analysis device includes a device that extracts a plurality of defects from the laser dark-field image on the screen.

9. A particle defect examination apparatus according to claim 3, wherein the analysis device includes a device that extracts all defects from the laser dark-field image on the screen.

10. A particle defect examination apparatus comprising:

an optical microscope that photographs an image of at least one defect;

a scanning electron microscope;

a storage device that stores an accurate offset amount between focal positions of the optical microscope and the scanning electron microscope;

an analysis device that analyzes the image to readjust a focused position of the optical microscope; and

a device that automatically adjust a focus of the scanning electron microscope by adding a readjusted amount of the focused position of the optical microscope to the offset amount.

11. A particle defect examination apparatus according to claim 10, wherein the analysis device includes a device that extracts one defect from the laser dark-field image on the screen.

12. A particle defect examination apparatus according to claim 10, wherein the analysis device includes a device that extracts a plurality of defects from the laser dark-field image on the screen.

13. A particle defect examination apparatus according to claim 10, wherein the analysis device includes a device that extracts all defects from the laser dark-field image on the screen.

14. A particle defect examination apparatus according to claim 10, wherein the analysis device includes a device that obtains an image having a minimum area provided by the optical microscope.

15. A particle defect examination apparatus according to claim 10, wherein the analysis device includes a device that obtains a peak value of a luminance signal from the image obtained by the optical microscope.

16. A particle defect examination apparatus according to claim 10, wherein the analysis device includes a device that specifies a defect area that provides a maximum differential value as a result of differential scanning of the image on a screen on the optical microscope.

17. A particle defect examination apparatus according to claim 10, wherein the analysis device includes:

a first device that obtains an image having a minimum area provided by the optical microscope;

a second device that obtains a peak value of a luminance signal from the image obtained by the optical microscope; and

a third device that specifies defect area that provides a maximum differential value as a result of differential scanning of the image on a screen on the optical microscope.

18. A particle defect examination apparatus according to claim 17, wherein the analysis device includes a device that compares results obtained by the first device, the second device and the third device to determine a focused position of the optical microscope.

19. A particle defect examination apparatus according to claim 18, wherein the analysis device determines a focused position of the optical microscope when the first device, the second device and the third device provide generally the same positional information.

20. A particle defect examination apparatus according to claim 18, wherein the analysis device allows a selection of one of the results obtained by the first device, the second device and the third device when the first device, the second device and the third device provide different positional information.