Electrostatic chuck with dielectric coating
First Claim
1. A substrate support comprising:
- a body having a support surface, a mounting surface disposed opposite the support surface and at least one side separating the support surface and mounting surface;
one or more conductive members disposed within the body; and
a dielectric coating disposed on at least the mounting surface.
1 Assignment
0 Petitions
Accused Products
Abstract
Generally, an electrostatic chuck having a dielectric coating is provided. In one embodiment, an electrostatic chuck includes a support surface, a mounting surface disposed opposite the support surface and at least one side separating the support surface and the mounting surface which defines a support body. One or more conductive members are disposed within the support body to generate an electrostatic attraction between the body and a substrate disposed thereon. A dielectric coating is disposed on the mounting surface of the support body to minimize undesired current leakage therethrough. Optionally, the dielectric coating may be additionally disposed on one or more of the sides and/or the support surface.
34 Citations
27 Claims
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1. A substrate support comprising:
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a body having a support surface, a mounting surface disposed opposite the support surface and at least one side separating the support surface and mounting surface;
one or more conductive members disposed within the body; and
a dielectric coating disposed on at least the mounting surface. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 16, 17, 18, 19, 20, 21, 22, 24, 25, 26, 27)
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15. A substrate support comprising:
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a ceramic support body having a support surface adapted to support a substrate and an opposing mounting surface;
a plurality of holes disposed in the support surface coupled to a passage disposed in the body;
one or more conductive members disposed within the support body;
a coating disposed on at least the mounting surface; and
a ceramic porous member disposed within the passage and separated the support surface by a portion of the body having the holes disposed therein.
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23. A process chamber for processing a substrate comprising:
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an evacuable chamber defining an interior volume;
a gas supply fluidly coupled to the interior volume;
a temperature control plate disposed in the interior volume; and
an electrostatic chuck comprising;
a support body having an upper portion and a lower portion, the upper portion having a support surface and the lower portion having a mounting surface disposed on the temperature control plate;
one or more conductive members disposed in the support body; and
a dielectric coating disposed on the mounting surface.
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Specification